Proceedings ArticleDOI
Design and fabrication of micromirror arrays for UV lithography
TLDR
In this article, the authors designed and fabricated a 2048x512 pixel UV-SLM with individually addressable aluminum micromirrors, which can be used for direct writing systems for semiconductor and printing, and UV stimulated biochemistry.Abstract:
Modern UV-lithography is searching for new highly parallel writing concepts. Spatial light modulation (SLM) offers such possibilities but special emphasis must be put on the ability of SLM devices to handle ultraviolet light (UV). We designed and fabricated micromirror arrays which fulfill these requirements. Possible applications for such UV-SLMs are direct writing systems for semiconductor and printing, and UV-stimulated biochemistry. For deep UV laser pattern generation (248 nm) e.g. we designed and fabricated a 2048x512 pixel UV-SLM with individually addressable aluminum micromirrors. They are illuminated by an excimer laser pulse and imaged onto a photomask substrate. A complete pattern is stitched together at a rate of 1 kHz. The minimum feature size is 320 nm and analog modulation of the pixels allows to realize an address grid of only 1.6 nm. The design of the array is modular so that other array sizes can be tailor made to customers needs. Design and fabrication aspects for a CMOS compatible realization of these micromirror arrays are addressed as well as their performance in lithography applications.© (2001) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only.read more
Citations
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Journal ArticleDOI
A review of micromirror arrays
TL;DR: A review of micromirror array (MMA) technologies can be found in this paper, where the performance capabilities of 277 MMAs from 49 companies and 23 academic research groups are categorized and compared.
Journal ArticleDOI
One-Megapixel Monocrystalline-Silicon Micromirror Array on CMOS Driving Electronics Manufactured With Very Large-Scale Heterogeneous Integration
TL;DR: In this article, the authors demonstrate the first high-resolution spatial-light-modulator chip with 1 million tilting micromirrors made of monocrystalline silicon on analog highvoltage complementary metal-oxide-semiconductor driving electronics.
Patent
System and method for calibrating a spatial light modulator array using shearing interferometry
Azat Latypov,Sherman K. Poultney +1 more
TL;DR: In this article, a system for calibrating a spatial light modulator array includes an illumination system and a spatio-temporal light modulation array that reflects or transmits light from the illumination system.
Proceedings ArticleDOI
Reliability test and failure analysis of optical MEMS
TL;DR: In this article, the authors designed and fabricated a 2048/spl times/512 pixel optical MEMS with individually addressable aluminum micro-mirrors, and set up test and characterization systems for failure analysis and lifetime testing.
Proceedings ArticleDOI
Application of spatial light modulators for microlithography
TL;DR: The Fraunhofer IPMS and Micronic Laser Systems AB have developed a technology for the maskless DUV microlithography using spatial light modulation (SLM) as mentioned in this paper.
References
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Journal Article
Deformable micromirror devices as phase-modulating high-resolution light valves
H. Kück,Wolfgang Doleschal,Andreas Gehner,W. Grundke,R. Melcher,J. Paufler,R. Seltmann,G. Zimmer +7 more
TL;DR: In this paper, two different technologies for deformable micromirror devices as phase-modulating light valves for high-resolution optical applications are reported, which are compatible with a 30 V CMOS technology for active matrix addressing.
Journal Article
High-throughput optical direct write lithography
New architecture for Laser pattern generators for 130 nm and beyond
TL;DR: In this article, a new breed of pattern generators for photomasks using a new DUV spatial light modulator (SLM) technology is under development in a collaborative effort between Micronic Laser Systems AB, Taby, Sweden and the Fraunhofer Institute for Microelectronic Circuits and Systems (FhG-IMS), Dresden, Germany.
Proceedings ArticleDOI
Micromirrors for direct writing systems and scanners
Hubert Lakner,Wolfgang Doleschal,Peter Duerr,Andreas Gehner,Harald Schenk,Alexander Wolter,G. Zimmer +6 more
TL;DR: In this paper, three different types of deformable mirror Spatial Light Modulators (SLMs) based on device concepts like Viscoelastic Control Layer (VCL), Cantilever Beam Mirror (CBM), and Moving Liquid Mirror (MLM) have been developed.
Test system for micro mirror arrays
Peter Dürr,Thomas Tanneberger,Alexander Wolter,Wolfram Kluge,Wolfgang Doleschal,Hubert Lakner +5 more
TL;DR: A test system has been set up using a white light interferometer (WLI), which allows to measure the response of each and every SLM pixel to applied voltages.