Patent
Fabrication of iron oxide pattern
TLDR
Patterned iron oxide films are produced on substrates by oxidative decomposition of polyvinyl ferrocene as mentioned in this paper, where the polymer may be applied to the substrate in the form of a solution by spinning.Abstract:
Patterned iron oxide films are produced on substrates by oxidative decomposition of polyvinyl ferrocene. The polymer may be applied to the substrate in the form of a solution by spinning. Resultant films may be relatively soluble or relatively insoluble in acidic media depending upon processing conditions. Soluble films are of interest for hard copy masks designed for use in the fabrication of printed circuits. Such masks may be pattern-delineated by photoresist techniques or by selective insolubilization. Alternatively, patterns may result from selective deposition or removal of the polymer prior to decomposition.read more
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Fine pattern forming method
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Patent
Electron-beam treated CDO films
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Patent
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TL;DR: In this paper, the reactive ion etching resistance of radiation sensitive resist composition is enhanced by adding at least one organometallic compound to a radiation sensitive polymer, which can be patterned and used as mask for patterning an underlying layer.
Patent
Taggants with explosive induced magnetic susceptibility
TL;DR: In this paper, a color-coded taggant for post-detonation identification of explosive material is proposed, which can be used for retrieval after detonation of an explosive.
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Patent
Pattern delineation method and product so produced
TL;DR: In this paper, a process for the fabrication of a supported iron oxide pattern involves electromagnetic wave irradiation of a blank, which results in insolubilization so that delineation is accomplished by immersing the processed blank in a suitable solvent.
Patent
Electrophotographic composition and element
TL;DR: In this article, the authors developed a system for ORGANO-METALLIC PHOTOCONDUCTIVE COMPOSITIONS SENSITIZED with these COMPOUNDS have increased ELECTROPHOTOGRAPHIC SPEED and are more sensitive in the ULTRAVIOLET region of the SPECTRUM.
Patent
Microcircuit mask and method
TL;DR: In this article, a method of making thin films of ALPHA FE2O3 by a Reactive SPUTtering TECHNIQUE, the PARAMETERS of which are CONTROLLED within SPECIFIED RANGES SO that the RESULTANT FILM has GREATER OPTICAL AND PHYSICAL DENSITY, GREATER SCRATCH and ABRASION RESISTance and HIGHER this articleRACTIVE INDEX CONVENTIONAL ReactIVE SPUTTERing.