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Fluid injector for and method of prolonged delivery and distribution of reagents into plasma

Barry Lee-Mean Yang
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TLDR
In this paper, a method and apparatus for injecting a fluid into a plasma stream with a uniform distribution and with reduced likelihood of clogging over prolonged use is provided, which can be integrated into or interchangeable within an injector system that can be designed for operation within a plasma deposition apparatus.
Abstract: 
A method and apparatus for injecting a fluid into a plasma stream with a uniform distribution and with reduced likelihood of clogging over prolonged use is provided. An injector includes a first channel portion for restricting a flow of the fluid and having a shape such that inner walls of the first channel portion are parallel to a first axis. The injector also includes a second channel portion in fluid communication with the first channel portion. The second channel portion includes a recessed portion such that inner walls of the second channel portion diverge from the first axis at a predetermined angle. The second channel portion reduces a buildup of a clogging layer on the inner walls of the second channel portion over a period of use. In addition, the injector can further include a tip portion that protrudes into the plasma. The injector can be integrated into or interchangeable within an injector system that can be designed for operation within a plasma deposition apparatus.

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References
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Reactant gas ejector head and thin-film vapor deposition apparatus

Takeshi Murakami, +5 more
TL;DR: In this article, a reactant gas ejector head in a thin-film vapor deposition apparatus includes at least two reaction inlet passages for introducing reactant gases, a gas mixing chamber for mixing reactive gases introduced from the reactant inlet passage, and a nozzle disposed downstream of the mixing chamber to rectify the mixed gases from the gas mixing chambers into a uniform flow and applying the uniform flow to a substrate.
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