Patent
Method of preparing optically imaged high performance photomasks
TLDR
In this paper, an organic antireflection coating was applied over a surface of a photomask which included a chrome-containing layer, and a chemically-amplified DUV photoresist over the organic antireslection coating.Abstract:
One principal embodiment of the disclosure pertains to a method of optically fabricating a photomask using a direct write continuous wave laser, comprising a series of steps including: applying an organic antireflection coating over a surface of a photomask which includes a chrome-containing layer; applying a chemically-amplified DUV photoresist over the organic antireflection coating; post apply baking the DUV photoresist over a specific temperature range; exposing a surface of the DUV photoresist to the direct write continuous wave laser; and, post exposure baking the imaged DUV photoresist over a specific temperature range. The direct write continuous wave laser preferably operates at a wavelength of 244 nm or 257 nm. In an alternative embodiment, the organic antireflection coating may be applied over an inorganic antireflection coating which overlies the chrome containing layer.read more
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Patent
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Patent
Anti-reflective coatings for photolithography and methods of preparation thereof
Teresa Baldwin,Joseph Kennedy,Nancy Iwamoto,Tadashi Nakano,William Bedwell,Jason Stuck,Mello Hebert,Arlene J. Suedmeyer +7 more
TL;DR: In this article, anti-reflective coating materials for ultraviolet photolithography include at least one absorbing compound and at least three material modification agents, such as porogen, high-boiling solvent, capping agent, leveling agent, catalyst, replacement solvent, pH tuning agent, and/or a combination thereof that are incorporated into inorganic-based materials or inorganic compositions and compounds.
References
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Patent
Positive-working photoresist composition
TL;DR: In this article, a positive working photoresist composition comprising an alkali-soluble novolak resin obtained by condensation reaction of a mixture of phenols, which are constituted of specified proportions of m-cresol and two kinds of specific phenols with an aldehyde and having a Mw/Mn ratio of from 1.5 to 4.0 is presented.
Patent
Composition for photo imaging
TL;DR: In this paper, an improved photoimagable cationically polymerizable epoxy based coating material is provided, which includes an epoxy resin system consisting essentially of between about 10% and about 80% by weight of a polyol resin which is a condensation product of epichlorohydrin and bisphenol A having a molecular weight between about 40,000 and 130,000.
Patent
Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof
Marie Angelopoulos,Katherina Babich,Alfred Grill,Scott Halle,Arpan P. Mahorowala,Vishnubhai Vitthalbhai Patel +5 more
TL;DR: In this article, the RCHX layer can be vapor-deposited and patterned by patterning the energy active material and transferring the pattern to the rchex layer.
Patent
Antireflective coating compositions comprising photoacid generators
TL;DR: In this paper, a photoacid generator that is activated during exposure of an overcoated photoresist is proposed. But the generator is not suitable for use as an antireflective composition, particularly for deep UV applications.
Patent
Mid and deep-UV antireflection coatings and methods for use thereof
Robert R. Dichiara,James Thomas Fahey,Pamela E. Jones,Christopher F. Lyons,Wayne M. Moreau,Ratnam Sooriyakumaran,Gary T. Spinillo,Kevin M. Welsh,Robert Lavin Wood +8 more
TL;DR: An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation was proposed in this article.