Patent
Phase shift mask blank, photomask blank and their manufacturing devices and processes
TLDR
In this paper, a DC magnetron sputtering device for manufacturing a halftone phase shift mask blank was proposed, in which the target surface is placed facing down against the direction of gravity, a full erosion cathode is used, the corner 5a of the end of the target and the corner of an earth shield are rounded off (corner rounding).Abstract:
PROBLEM TO BE SOLVED: To provide a device, process, etc., for manufacturing a phase shift mask blank wherein the total number of particles and pinholes with diameters larger than about half the exposure wavelength of a translucent film is 0.1/cm 2 . SOLUTION: In a DC magnetron sputtering device for manufacturing a halftone phase shift mask blank, for example, the target surface is placed facing down against the direction of gravity, a full erosion cathode is used, the corner 5a of the end of the target and the corner of an earth shield are rounded off (corner rounding), the end of the target 5b, an exposed backing plate surface 4b and the surface of the earth shield 12 are roughened, and the earth shield 12 is placed above (on the backing plate side) the target surface d. COPYRIGHT: (C)2003,JPOread more
Citations
More filters
Patent
Photomask blank and photomask
Hiroki Yoshikawa,Yukio Inazuki,Satoshi Okazaki,Takashi Haraguchi,Masahide Iwakata,Mikio Takagi,Yuichi Fukushima,Tadashi Saga +7 more
TL;DR: In this article, a photomask blank is provided comprising an etch stop film which is disposed on a transparent substrate and is resistant to fluorine dry etching and removable by chlorine dry etch.
Patent
Methods of manufacturing mask blank and transfer mask
TL;DR: In this paper, a mask blank is adapted to be formed with a resist pattern by electron beam writing and having a light-shielding film and an etching mask film of an inorganic-based material resistant to etching.
Patent
Manufacturing method of mask blank and transfer mask
TL;DR: In this article, a target is arranged obliquely upward from a substrate, and a sputtered surface of the target faces the main surface of a substrate in an oblique upward direction.
Patent
Method for manufacturing photomask blank
Takashi Yoshii,Yoshio Kawai,Yukio Inazuki,Satoshi Watanabe,Akira Ikeda,Toyohisa Sakurada,Hideo Kaneko +6 more
TL;DR: In this paper, a photomask blank obtained by forming a resist film after performing a silylation process on a silicon-containing inorganic film is presented, which can inhibit generation of defects due to resist residues or the like after development.
Patent
Attenuating phase deviation mask blank and photomask
Hans Becker,Buttgereit Ute,S. Jay Chey,Goetzberger Oliver,Günter Hess,Markus Renno,Frank Schmidt,Frank Sobel,ウーテ・ブットゲライト,エス・ジェイ・チェイ,オリバー・ゲーツベルガー,ギュンター・ヘス,ハンス・ベッケル,フランク・シュミット,フランク・ソーベル,マルクス・レノ +15 more
TL;DR: In this article, an attenuating phase deviation mask consisting of a substrate and a thin film system applied on one surface of the substrate and is to be used in lithography is presented, which is capable of producing a photomask having almost 180° phase deviation and at least 0.001% transmission for exposure at ≤ 200 nm wavelength.