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Journal ArticleDOI

Preparation of isotope targets by heavy ion sputtering

G. Sletten, +1 more
- 01 Aug 1972 - 
- Vol. 102, Iss: 3, pp 459-463
TLDR
In this paper, heavy ion sputtering is a powerful method for the production of thin films of refractories, and both supported and self-supported films have been made, and the purity of the targets depends mainly on the purity in the starting material.
About
This article is published in Nuclear Instruments and Methods.The article was published on 1972-08-01. It has received 55 citations till now. The article focuses on the topics: Sputtering & Thin film.

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Citations
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Book ChapterDOI

Sputtering yield measurements

TL;DR: The conditions for performing reproducible sputtering measurements are a well-defined ion beam with high enough current and uniform current density, a low enough vacuum and a well characterized target as discussed by the authors, and different methods to determine total and differential sputtering yields, i.e., the measurement of the loss of target material and the flux of sputtered atoms, are outlined.
Journal ArticleDOI

Sputtering of multicomponent materials

TL;DR: A survey of the knowledge of preferential sputtering of certain species in multielement materials, the subsequent formation of a near surface layer with altered composition, the total sputtering yields as a function of composition after steadystate conditions are established, and the angular ejection distribution of different species is given in this paper.
Journal ArticleDOI

Fusion cross sections for the 16O + 16O reaction

TL;DR: In this article, the fusion cross section for the 16O + 16O reaction was measured with a time-of-flight technique at energies Elab = 35, 45, 52, 60, 70 and 80 MeV.
Journal ArticleDOI

Deposition techniques for the preparation of thin film nuclear targets

TL;DR: In this article, the basic principles that regulate vacuum evaporation and the physical processes involved in thin film formation are discussed, and the principal methods of heating the evaporant are detailed and the means of measuring and controlling the film thickness are elucidated.
Journal ArticleDOI

Analysis of the primary process in isotope sputtering

TL;DR: In this paper, the authors investigated the influence of key input parameters on the relative sputter yields of isotopic mixtures with respect to the surface scattering effect, with the notable exception of the target-target interatomic potential, the surface barrier, and the treatment of nonbinary collisions.
References
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Journal ArticleDOI

Collection and Sputtering Experiments with Noble Gas Ions

TL;DR: In this paper, the collection and sputtering experiments described in this paper were made with the 90° electromagnetic isotope separator in our laboratory and were made using a 90° EIS separator.
Journal ArticleDOI

Self-supporting metal foils prepared from the oxides of the separated isotopes of rare earth elements

TL;DR: In this article, the results of the separated isotopes of Yb, Sm, Dy, Er, Nd, Gd and Lu were obtained from the oxides in batches of 20-40 mg by reduction in vacuo with lanthanum or thorium metal powder.