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Proceedings ArticleDOI

Resolution enhancement of photon sieve based on apodization

TLDR
In this article, the photonic sieve has been used as a novel diffractive optical element modulating either amplitude or phase which consists of a great number of pinholes distributed appropriately over the Fresnel zones for focusing and imaging of light.
Abstract
Photon sieve is a novel diffractive optical element modulating either amplitude or phase which consists of a great number of pinholes distributed appropriately over the Fresnel zones for the focusing and imaging of light. Photon sieve has the advantages of the diameter of pinholes beyond the limitation of the corresponding Fresnel zone width and the minimum background in the focal plane. Furthermore, photon sieve can be fabricated on a single surface without any supporting struts required unlike the Fresnel zone plate. Photon sieve can be used as EUV telescope for solar orbiter, space-based surveillance telescope operating at visible light, or other imaging components. Photon sieve can also be used as one of the promising lithographic tools for nanoscale science and engineering to obtain the lower cost, higher flexibility and better resolution. The approaches to enhancing imaging resolution of photon sieve are presented in detail. According to Fresnel-Kirchhoff diffraction theory, the diffractive field of photon sieve is described by means of the discrete fast Fourier transform algorithm. The related contents include the calculation of point spread function, the suppression of side lobes, the imaging bandwidth, the physical limit of resolution, and the diffraction efficiency. Imaging properties of photon sieve are analyzed on the basis of precise test.

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Citations
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Proceedings ArticleDOI

Experimental characterization of optical properties of photon sieve

TL;DR: In this article, a hybrid lens consisting of refractive optical surfaces and photon sieve is used to correct the chromatic aberration of a phase-photon sieve and surface plasmon polaritons technology may be promising approaches to improve the diffraction efficiency.
Book ChapterDOI

Nanolithography in the Evanescent Field of Noble Metals

TL;DR: In this article, a number of near field nanolithography techniques have been explored recently by some research groups, such as Maskless Lithography (ML2), Maskless LiDAR (ML3), and imprinting, but the techniques of breaking the limitation of 32 nm resolution is far from mass production.
Book ChapterDOI

Emerging Maskless Nanolithography Based on Novel Diffraction Gratings

TL;DR: Cheng et al. as discussed by the authors presented a study on the performance of nano-bionics at the Chinese University of Hong Kong and the Chinese Academy of Optics and Electronics, Hong Kong.
References
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Journal ArticleDOI

Sharper images by focusing soft X-rays with photon sieves

TL;DR: It is shown that a large number of pinholes distributed appropriately over the Fresnel zones make it possible to focus soft X-rays to spot sizes smaller than the diameter of the smallest pinhole.
Book

Introduction to the optical transfer function

TL;DR: In this article, the authors present a mathematical theory of OTF optical design and image criteria merit functions and aberration balancing measurement calculation of the OTF - analytical methods calculation of OFT - numerical methods.
Journal ArticleDOI

Large optical photon sieve

TL;DR: A photon sieve with 10(7) holes has been constructed for operation at optical wavelengths and is diffraction limited over a significant bandwidth and has a moderate field of view.
Journal ArticleDOI

Broadband antihole photon sieve telescope

TL;DR: The diffraction-limited performance of a 1 m focal-length, f/10 element is demonstrated with a view toward constructing large lightweight telescopes for space applications.
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