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Journal ArticleDOI

Turning Value Monitoring of Narrow-band All-dielectric Thin-film Optical Filters

H.A. Macleod
- 01 Jan 1972 - 
- Vol. 19, Iss: 1, pp 1-28
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TLDR
In this article, the effects of errors in the turning value method of film-thickness monitoring on the performance of all-dielectric interference filters were studied theoretically by both an accurate and an approximate method, and it was shown that although the potential accuracy of the method in monitoring a single layer is very poor, the theoretical accuracy of peak frequency and the overall performance of complete narrow-band filters are extremely good.
Abstract
The effects, on the performance of all-dielectric interference filters, of errors in the turning value method of film-thickness monitoring, are studied theoretically by both an accurate and an approximate method. It is shown that, although the potential accuracy of the method in monitoring a single layer is very poor, the theoretical accuracy of peak frequency and the overall performance of complete narrow-band filters are extremely good. Poor performance of real production filters is therefore unlikely to be due to an inherent limitation of the method, but rather to a faulty application of it, or to other factors unconnected with the monitoring method.

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Citations
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Journal ArticleDOI

Monitoring of optical coatings.

TL;DR: In this paper, the principal monitoring arrangements in current use are surveyed with a brief account of their relative merits and it is shown that they are less able to cope with refractive index errors than with simple thickness errors and that tight control of material parameters is required to take advantage of recent advances in monitoring techniques.
Journal ArticleDOI

Optical monitoring of nonquarterwave multilayer filters.

TL;DR: It is shown that with an optical control system utilizing a broad spectral bandwidth, thickness errors can be reduced andmittance measurements with the precision necessary to achieve improved thickness control are attainable with existing instrumentation.
Journal ArticleDOI

Refractive index and inhomogeneity of thin films.

TL;DR: The existence in deposited materials of an inherent variation of the index of refraction normal to the surface is demonstrated and the thermal sensitivity of the layer properties and their tendency to adsorb atmospheric moisture must be taken into account before the residual differences between the two techniques can be explained.
Journal ArticleDOI

Computational manufacturing as a bridge between design and production

TL;DR: The goal is to attract attention to the increasing importance of computational manufacturing at the current state of the art in the design and manufacture of optical coatings and to demonstrate possible applications of this research tool.
Journal ArticleDOI

Error Compensation Mechanisms in Some Thin-film Monitoring Systems

TL;DR: It is shown that in the turning value monitoring of broad-band components the most important factor is the small consistent overshoot made by experienced plant operators and that, to be effective, a pre-coating must minimize the interactions between errors caused by the successive overshoots.
References
More filters
Book

Thin-film optical filters

H. A. Macleod
TL;DR: In this paper, the authors present a theoretical analysis of thin-film dielectric materials and apply it to filter and coating applications, showing that layer uniformity and thickness monitoring are important factors affecting layer and coating properties.
Journal ArticleDOI

Methods of Altering the Characteristics of a Multilayer Stack

TL;DR: In this article, the reflectance R of a multilayer stack is changed as either the thickness t or refractive index n of any of the films in the stack is altered.
Journal ArticleDOI

Properties of All-Dielectric Interference Filters. I. A New Method of Calculation

TL;DR: In this article, the reflection coefficient of a system of perfect quarter-wave layers is obtained in terms of the Fresnel coefficients of various boundaries by a simple summation process, and this result is used to calculate the phase change on reflection from approximate quarterwave layers and this is shown to depend linearly on the phase errors of individual layers.
Journal ArticleDOI

Resolving Power of Multilayer Filters

TL;DR: In this paper, an expression for the frequency dependence of the phase of reflections from quarter-wave multilayers is deduced, which is included in a general formula for the resolving power of single half-wave filters and extended to the synthesis of multi-half-wave, or "coupled,” filters.
Journal ArticleDOI

All-Dielectric High-Reflecting Layers

TL;DR: In this paper, a simple method is described for calculating the effect of thickness errors in systems of multilayer dielectric films, and the results of its application to systems of low-index-high-index quarter-wave pairs are given.