Journal ArticleDOI
UV interferometry for microstructure measurements
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TLDR
In this paper, the capabilities and problems of interference microscopy in the UV region are discussed and a two-step procedure is proposed to reduce the wavelength in the interference by a factor of about 10.Abstract:
The authors discuss the capabilities and problems of interference microscopy in the UV region. The motivation is obvious: as the dimensions in electronics, mechanics and optics become smaller and smaller, measuring principles are required which provide lateral resolutions in the sub- mu m and longitudinal resolutions in the nm range. Due to its limited resolution optics using visible light as to cede the field to scanning electron microscopy. However, if it were possible to enhance the resolution using UV light, optics has some advantageous features: parallel data acquisition with freedom from special preparation methods and, therefore, no destruction of the object. One can think of a two-step procedure to reduce the wavelength in interference microscopy by a factor of about 10.read more
Citations
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Journal ArticleDOI
Ultraviolet interferometry with apochromatic reflection optics
Wolfgang Emer,Johannes Schwider +1 more
TL;DR: To improve the resolution and the sensitivity of optical metrology, an interferometer for vacuum-ultraviolet wavelengths is constructed and the influence of the wavelength is examined, especially with regard to the period of the object's structure.
Proceedings ArticleDOI
Wafer-level micro-optics: trends in manufacturing, testing, and packaging
TL;DR: In this article, the authors report on the state of the art in wafer-based manufacturing, testing and packaging of light focusing, light shaping, and imaging components for DUV Lithography Steppers and Scanners.
Journal ArticleDOI
Improving the resolution of interference microscopes
Marc Jobin,Raphael Foschia +1 more
TL;DR: In this article, an interference optical microscope (IOM) was used to improve the resolution of graphite steps in phase shift mode (PSM) at large field of view through a proper averaging time during acquisition.
An Evaluation of Thermal Deformation Behavior in Electronic Package Using UV Moire Interferometry
Soon-Bok Lee,Jin-Hyung Park +1 more
Proceedings ArticleDOI
Evaluation of thermal deformation behavior in electronic package using UV moire interferometry
Jin-Hyoung Park,Soon-Bok Lee +1 more
TL;DR: In this paper, the authors constructed a moire interferometry system by utilizing an ultraviolet laser (UV) for thermal deformation measurement in flip-chip packages, which achieved higher resolution than He-Ne (633nm) system.
References
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Journal ArticleDOI
Coupled wave theory for thick hologram gratings
TL;DR: In this paper, a coupled wave analysis of the Bragg diffraction of light by thick hologram gratings is given, analogous to Phariseau's treatment of acoustic gratings and to the dynamical theory of X-ray diffraction.
Journal ArticleDOI
Analysis and applications of optical diffraction by gratings
Thomas K. Gaylord,M. G. Moharam +1 more
TL;DR: In this article, an exact formulation of the grating diffraction problem without approximations is presented, using a series of fundamental assumptions, which reduces to the various existing approximate theories in the appropriate limits.
Journal ArticleDOI
Digital wave-front measuring interferometry: some systematic error sources.
TL;DR: To study the occurrence of wave-front irregularities caused by dust particles a model has been developed and countermeasures derived which assure sufficient regularity of contour line plots, and the repeatability of the present experimental setup was better than λ/200 within the 3σ limits.
Book ChapterDOI
IV Advanced Evaluation Techniques in Interferometry
TL;DR: This chapter describes the advanced evaluation techniques in interferometry and identifies the types of error sources—namely, environmental errors, errors that are dependent on the method, and errors typically encountered in Interferometry.