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What are the potential solutions to mitigate the self-heating phenomenon induced by high bias stress in electronic devices? 


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To mitigate the self-heating phenomenon induced by high bias stress in electronic devices, several potential solutions have been proposed. One approach is to engineer the device structure by introducing a buried oxide (BOX) layer made of a material with higher thermal conductivity, such as crystalline-diamond-like carbon (DLC) . Another solution involves using a diamond-based dielectric material, which has significantly larger thermal conductivity than SiO2, to reduce the lattice temperature of the device . Additionally, integrating a heat spreading layer made of a high thermal conductivity material, such as a 1-µm thick Ag film, into the device can help mitigate the self-heating effect . These solutions aim to provide an appropriate heat flow path and improve the thermal reliability of electronic devices under high bias stress conditions.

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The provided paper does not mention potential solutions to mitigate the self-heating phenomenon induced by high bias stress in electronic devices. The paper focuses on proposing a buried oxide (BOX) engineered nanosheet FET structure to mitigate self-heating-induced thermal degradation.
The potential solution to mitigate the self-heating phenomenon induced by high bias stress in electronic devices is the integration of a heat spreading layer (HSL) made using a 1-µm thick Ag film with high thermal conductivity.
The provided paper does not mention any potential solutions to mitigate the self-heating phenomenon induced by high bias stress in electronic devices. The paper focuses on dynamic biasing to mitigate electrical stress in integrated resistors.
The provided paper does not discuss potential solutions to mitigate the self-heating phenomenon induced by high bias stress in electronic devices.
The provided paper does not mention potential solutions to mitigate the self-heating phenomenon induced by high bias stress in electronic devices.

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