C
Christopher Harrison
Researcher at Schlumberger
Publications - 84
Citations - 6386
Christopher Harrison is an academic researcher from Schlumberger. The author has contributed to research in topics: Copolymer & Thin film. The author has an hindex of 26, co-authored 84 publications receiving 6144 citations. Previous affiliations of Christopher Harrison include National Institute of Standards and Technology & Princeton University.
Papers
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Journal ArticleDOI
Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter
TL;DR: In this paper, dense periodic arrays of holes and dots have been fabricated in a silicon nitride-coated silicon wafer and transferred directly to the underlying silicon oxide layer by two complementary techniques.
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A buckling-based metrology for measuring the elastic moduli of polymeric thin films
Christopher M. Stafford,Christopher Harrison,Kathryn L. Beers,Alamgir Karim,Eric J. Amis,Mark R. VanLandingham,Mark R. VanLandingham,Ho-Cheol Kim,Willi Volksen,Robert D. Miller,Eva E. Simonyi +10 more
TL;DR: An elegant, efficient measurement method that yields the elastic moduli of nanoscale polymer films in a rapid and quantitative manner without the need for expensive equipment or material-specific modelling is introduced.
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Elastic Moduli of Ultrathin Amorphous Polymer Films
TL;DR: In this article, the elastic moduli of ultrathin poly(styrene) and poly(methylmethacrylate) (PMMA) films of thickness ranging from 200 nm to 5 nm were investigated using a buckling-based metrology.
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Using Surface Active Random Copolymers To Control the Domain Orientation in Diblock Copolymer Thin Films
Elbert E. Huang,Thomas P. Russell,Christopher Harrison,Paul Chaikin,Richard A. Register,Craig J. Hawker,Jimmy W. Mays +6 more
TL;DR: In this article, the structure of thin films of a symmetric diblock copolymer, P(dS-b-MMA) (dS = perdeuterated styrene, MMA = methyl methacrylate), was investigated near preferential and nonpreferential (neutral) surfaces.
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Dense arrays of ordered GaAs nanostructures by selective area growth on substrates patterned by block copolymer lithography
R. R. Li,P.D. Dapkus,Mark E. Thompson,W. G. Jeong,Christopher Harrison,Paul Chaikin,Richard A. Register,Douglas H. Adamson +7 more
TL;DR: In this paper, a hexagonally ordered array of nanometer-scale holes with a density as high as ∼1011/cm2 was created using block copolymer lithography, in which a thin layer of diblock copolymers was used as an etching mask to make dense holes in a 15nm-thick SiNx film.