D
Didier Stiévenard
Researcher at Lille University of Science and Technology
Publications - 143
Citations - 3801
Didier Stiévenard is an academic researcher from Lille University of Science and Technology. The author has contributed to research in topics: Silicon & Scanning tunneling microscope. The author has an hindex of 34, co-authored 142 publications receiving 3635 citations. Previous affiliations of Didier Stiévenard include University of Angers & Centre national de la recherche scientifique.
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Native defects in gallium arsenide
TL;DR: In this article, the authors describe information which has been obtained on point defects detected in various types of GaAs materials using electron paramagnetic resonance as well as electrical and optical techniques, concluding that native defects are not simple intrinsic defects, with the exception of the antisites, but complexes formed by the interaction of such defects between themselves or with impurities.
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Gibbs-Thomson and diffusion-induced contributions to the growth rate of Si, InP, and GaAs nanowires
Vladimir G. Dubrovskii,N. V. Sibirev,G. E. Cirlin,I. P. Soshnikov,Wanghua Chen,Rodrigue Lardé,Emmanuel Cadel,Philippe Pareige,Tao Xu,Bruno Grandidier,J. P. Nys,Didier Stiévenard,M. Moewe,L.C. Chuang,Connie J. Chang-Hasnain +14 more
TL;DR: In this paper, a general model for the vapor-liquid-solid nanowire (NW) growth rates was presented, which accounts for adatom diffusion from the substrate and sidewalls into the Au catalyst drop as well as the Gibbs-Thomson effect of elevated chemical potential in the drop with a curved surface.
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Nanooxidation using a scanning probe microscope : an analytical model based on field induced oxidation
TL;DR: In this article, the authors explain quantitatively the variation of the oxide height with the polarization and the speed of the tip with a model based on field induced oxidation and estimate the thermal activation energy of the oxidation process.
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Identification of a defect in a semiconductor: EL2 in GaAs.
TL;DR: It is concluded that EL2 is a complex formed by an isolated As-GaAs defect and an intrinsic interstitial defect, namely ${\mathrm{As}}_{\ mathrm{i}}$ or £1,000,000 or more, respectively.
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Characterization of scanning tunneling microscopy and atomic force microscopy-based techniques for nanolithography on hydrogen-passivated silicon
TL;DR: In this paper, a comparison between scanning tunneling microscope (STM) and atomic force microscope (AFM) nanolithography techniques based on local oxidation of silicon is proposed.