Core/Shell Nanoparticles: Classes, Properties, Synthesis Mechanisms, Characterization, and Applications

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Principles Of Fluorescence Spectroscopy

Band bending in semiconductors: chemical and physical consequences at surfaces and interfaces.

Control of spontaneously emitted light lies at the heart of quantum optics. It is essential for diverse applications ranging from miniature lasers and light-emitting diodes, to single-photon sources for quantum information, and to solar energy harvesting. To explore such new quantum optics applications, a suitably tailored dielectric environment is required in which the vacuum fluctuations that control spontaneous emission can be manipulated. Photonic crystals provide such an environment: they strongly modify the vacuum fluctuations, causing the decay of emitted light to be accelerated or slowed down, to reveal unusual statistics, or to be completely inhibited in the ideal case of a photonic bandgap. Here we study spontaneous emission from semiconductor quantum dots embedded in inverse opal photonic crystals. We show that the spectral distribution and time-dependent decay of light emitted from excitons confined in the quantum dots are controlled by the host photonic crystal. Modified emission is observed over large frequency bandwidths of 10%, orders of magnitude larger than reported for resonant optical microcavities. Both inhibited and enhanced decay rates are observed depending on the optical emission frequency, and they are controlled by the crystals’ lattice parameter. Our experimental results provide a basis for all-solid-state dynamic control
of optical quantum systems.

Controlling the dynamics of spontaneous emission from quantum dots by photonic crystals

ZnO nanostructures for optoelectronics: Material properties and device applications

Etching characteristics of nondoped GaN films with the polar surface in KOH solution have been investigated. It is confirmed that the continuous etching in KOH solution takes place only for the GaN films with N-face (−c) polarity independent of the deposition method and growth condition. It is found by x-ray photoelectron spectroscopy (XPS) analysis for the Ga face (+c) and N-face (−c) GaN films that the atomic composition of the +c surface is not changed before and after dipping in KOH solution and that on the other hand, the amount of oxygen (oxide) on the −c surface is significantly decreased by the etching. It is also found that the band bending increases by −0.4±0.2 and 0.6±0.2 eV for the +c and −c surfaces after etching, respectively. This is discussed in terms of the surface chemistry. Based on the XPS result, the selective etching of the GaN polar surface is pointed out to originate from bonding configuration of nitrogen at the surface.

Selective etching of GaN polar surface in potassium hydroxide solution studied by x-ray photoelectron spectroscopy

Highly sensitive photodetection even approaching the single-photon level is critical to many important applications. Graphene-based hybrid phototransistors are particularly promising for high-sensitivity photodetection because they have high photoconductive gain due to the high mobility of graphene. Given their remarkable optoelectronic properties and solution-based processing, colloidal quantum dots (QDs) have been preferentially used to fabricate graphene-based hybrid phototransistors. However, the resulting QD/graphene hybrid phototransistors face the challenge of extending the photodetection into the technologically important mid-infrared (MIR) region. Here, we demonstrate the highly sensitive MIR photodetection of QD/graphene hybrid phototransistors by using plasmonic silicon (Si) QDs doped with boron (B). The localized surface plasmon resonance (LSPR) of B-doped Si QDs enhances the MIR absorption of graphene. The electron-transition-based optical absorption of B-doped Si QDs in the ultraviolet (UV) ...

Plasmonic Silicon Quantum Dots Enabled High-Sensitivity Ultrabroadband Photodetection of Graphene-Based Hybrid Phototransistors

Enhancement of the light emission of ZnO films was observed by coupling through localized surface plasmons. By sputtering Ag islands onto ZnO films, their band gap emission coming through the Ag island films was enhanced by threefolds, while the defect emission was quenched. The enhancement was found to be mainly dependent on the sputtering time of the Ag islands, which is related to the island size. Furthermore, the relative spectral position between the ZnO emission band and the localized surface plasmon resonance bands of Ag islands was found to be decisive for the enhancement or quenching of photoluminescence, indicating that the emission intensity of ZnO films can be controlled by the Ag island size and the localized surface plasmon resonance band position.

Enhancement of ZnO light emission via coupling with localized surface plasmon of Ag island film

The photoluminescence (PL) from defect-related states and Si nanoclusters was observed in the Si-rich silicon nitride films simultaneously. The weaker red-light emission of Si nanoclusters was obtained in the 1100°C annealed films with the 514.5nm excitation. Due to the quantum confinement effect, the PL peaks redshift with the increase of the excess Si concentration. Excited by the 325nm line, strong PL from N and Si dangling bond centers was observed in either the as-deposited films or the 1100°C annealed ones. The results demonstrate that the luminescence from defect-related states or Si nanoclusters is selected by the excitation energy.

Photoluminescence of Si-rich silicon nitride: Defect-related states and silicon nanoclusters

The electrically pumped ultraviolet (UV) random lasing in c-axis oriented ZnO polycrystalline films has been demonstrated. For this demonstration, a metal-oxide-semiconductor structure of Au∕SiOx(x<2)∕ZnO film was fabricated on a silicon substrate. With ever-higher forward bias where the negative voltage was connected to the silicon substrate, the UV electroluminescence from such a ZnO-based device transformed from the spontaneous emission to the random lasing in the ZnO film. It is believed that the recurrent scattering and interference of the enough strong electroluminescent UV light in the in-plane random cavities formed in the ZnO film leads to electrically pumped UV random lasing.

Dongsheng Li

Papers

Selective etching of GaN polar surface in potassium hydroxide solution studied by x-ray photoelectron spectroscopy

Plasmonic Silicon Quantum Dots Enabled High-Sensitivity Ultrabroadband Photodetection of Graphene-Based Hybrid Phototransistors

Enhancement of ZnO light emission via coupling with localized surface plasmon of Ag island film

Photoluminescence of Si-rich silicon nitride: Defect-related states and silicon nanoclusters

Electrically pumped ZnO film ultraviolet random lasers on silicon substrate