Carrier concentration profiles of two-dimensional electron gases are investigated in wurtzite, Ga-face AlxGa1−xN/GaN/AlxGa1−xN and N-face GaN/AlxGa1−xN/GaN heterostructures used for the fabrication of field effect transistors. Analysis of the measured electron distributions in heterostructures with AlGaN barrier layers of different Al concentrations (0.15<x<0.5) and thickness between 20 and 65 nm demonstrate the important role of spontaneous and piezoelectric polarization on the carrier confinement at GaN/AlGaN and AlGaN/GaN interfaces. Characterization of the electrical properties of nominally undoped transistor structures reveals the presence of high sheet carrier concentrations, increasing from 6×1012 to 2×1013 cm−2 in the GaN channel with increasing Al-concentration from x=0.15 to 0.31. The observed high sheet carrier concentrations and strong confinement at specific interfaces of the N- and Ga-face pseudomorphic grown heterostructures can be explained as a consequence of interface charges induced by ...

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Two-dimensional electron gases induced by spontaneous and piezoelectric polarization charges in N- and Ga-face AlGaN/GaN heterostructures

We present a comprehensive and up-to-date compilation of band parameters for all of the nitrogen-containing III–V semiconductors that have been investigated to date. The two main classes are: (1) “conventional” nitrides (wurtzite and zinc-blende GaN, InN, and AlN, along with their alloys) and (2) “dilute” nitrides (zinc-blende ternaries and quaternaries in which a relatively small fraction of N is added to a host III–V material, e.g., GaAsN and GaInAsN). As in our more general review of III–V semiconductor band parameters [I. Vurgaftman et al., J. Appl. Phys. 89, 5815 (2001)], complete and consistent parameter sets are recommended on the basis of a thorough and critical review of the existing literature. We tabulate the direct and indirect energy gaps, spin-orbit and crystal-field splittings, alloy bowing parameters, electron and hole effective masses, deformation potentials, elastic constants, piezoelectric and spontaneous polarization coefficients, as well as heterostructure band offsets. Temperature an...

Band parameters for nitrogen-containing semiconductors

Two dimensional electron gases in Al x Ga 12x N/GaN based heterostructures, suitable for high electron mobility transistors, are induced by strong polarization effects. The sheet carrier concentration and the confinement of the two dimensional electron gases located close to the AlGaN/GaN interface are sensitive to a large number of different physical properties such as polarity, alloy composition, strain, thickness, and doping of the AlGaN barrier. We have investigated these physical properties for undoped and silicon doped transistor structures by a combination of high resolution x-ray diffraction, atomic force microscopy, Hall effect, and capacitance‐voltage profiling measurements. The polarization induced sheet charge bound at the AlGaN/GaN interfaces was calculated from different sets of piezoelectric constants available in the literature. The sheet carrier concentration induced by polarization charges was determined

Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undoped and doped AlGaN/GaN heterostructures

Recent research results pertaining to InN, GaN and AlN are reviewed, focusing on the different growth techniques of Group III-nitride crystals and epitaxial films, heterostructures and devices. The chemical and thermal stability of epitaxial nitride films is discussed in relation to the problems of deposition processes and the advantages for applications in high-power and high-temperature devices. The development of growth methods like metalorganic chemical vapour deposition and plasma-induced molecular beam epitaxy has resulted in remarkable improvements in the structural, optical and electrical properties. New developments in precursor chemistry, plasma-based nitrogen sources, substrates, the growth of nucleation layers and selective growth are covered. Deposition conditions and methods used to grow alloys for optical bandgap and lattice engineering are introduced. The review is concluded with a description of recent Group III-nitride semiconductor devices such as bright blue and white light-emitting diodes, the first blue-emitting laser, high-power transistors, and a discussion of further applications in surface acoustic wave devices and sensors.

https://iopscience.iop.org/article/10.1088/0022-3727/31/20/001/pdf

Growth and applications of Group III-nitrides

During the last few years the developments in the field of III–nitrides have been spectacular. High quality epitaxial layers can now be grown by MOVPE. Recently good quality epilayers have also been grown by MBE. Considerable work has been done on dislocations, strain, and critical thickness of GaN grown on different substrates. Splitting of valence band by crystal field and by spin-orbit interaction has been calculated and measured. The measured values agree with the calculated values. Effects of strain on the splitting of the valence band and on the optical properties have been studied in detail. Values of band offsets at the heterointerface between several pairs of different nitrides have been determined. Extensive work has been done on the optical and electrical properties. Near band-edge spectra have been measured over a wide range of temperatures. Free and bound exciton peaks have been resolved. Valence band structure has been determined using the PL spectra and compared with the theoretically calcu...

III–nitrides: Growth, characterization, and properties

Important structural characteristics (correlation lengths of columnar crystallites, dislocation densities, angles of rotational disorder) of hexagonal GaN grown by metallorganic chemical vapour deposition on c-plane sapphire are determined by transmission electron microscopy and triple-axis X-ray diffractometry. GaN films exhibit an edge dislocation density in the range of 1011 cm−2, a tilt and twist angle of 0.1° and 1.3° and a columnar structure with a lateral and vertical correlation length of 150 and 1000 nm respectively. The determination of correlation lengths and dislocation densites from X-ray patterns was undertaken using two independent evaluation methods which are discussed in detail. It is also shown that triple-axis X-ray diffractometry is a highly suitable technique for the separation of different kinds of structural defects such as edge and screw dislocations that lead to a characteristic broadening of symmetric and asymmetric Bragg reflections. The correlation lengths and dislocat...

Defect structure of epitaxial GaN films determined by transmission electron microscopy and triple-axis X-ray diffractometry

AlxGa1−xN alloys were grown on c-plane sapphire by plasma-induced molecular beam epitaxy. The Al content x was varied over the whole composition range (0⩽x⩽1). The molar Al fraction was deduced from x-ray diffraction and for comparison by elastic recoil detection analysis. The composition of the alloys calculated from the lattice parameter c underestimates x. This is due to a deformation of the unit cell. The exact Al mole fraction and the biaxial strain of the alloys can be calculated by an additional determination of a, using asymmetric reflections. The results obtained by x-ray diffraction and elastic recoil detection provide evidence for the validity of Vegard’s law in the AlGaN system. In addition, the deviation of the band gap from a linear dependence on x was investigated. We found a downward bowing with a bowing parameter b=1.3 eV.

Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films

To determine the sound velocity in wurtzite AlxGa1−xN, we have used surface acoustic-wave (SAW) delay lines on AlxGa1−xN/c-Al2O3. AlxGa1−xN films with compositions from x=0 to x=1 were grown by plasma-induced molecular beam epitaxy. Starting from published data, we fine tuned the values of the elastic moduli used in numerical calculations such that the simulated and measured dispersion of the SAW were in good agreement. Based on these values, the surface and bulk acoustic-wave velocities of single-crystal AlxGa1−xN were determined as functions of the composition. The resulting SAW velocities ranged from 3700 to 5760 m/s for GaN and AlN, respectively.

Sound velocity of AlxGa1−xN thin films obtained by surface acoustic-wave measurements

Results of investigations of surface acoustic wave (SAW) devices working at high temperatures are presented in this paper. The considered substrate materials are lithium niobate (LiNbO/sub 3/), quartz and langasite (La/sub 3/Ga/sub 5/SiO/sub 14/). In addition, electrode materials and assembly, interconnect and packaging strategies are discussed or examined. Delay lines on LiNbO/sub 3/ had low SAW attenuation up to approx. 550/spl deg/C. The frequency response disappeared completely at about 800/spl deg/C. Delay lines on quartz had low SAW attenuation up to 500/spl deg/C, a temperature being significantly below the phase transition from /spl alpha/- to /spl beta/-quartz at 573/spl deg/C. Delay lines on La/sub 3/Ga/sub 5/SiO/sub 14/ withstand extreme temperatures: a SAW response was observed up to destruction of the packages used in these tests, however, resulted in a degradation of the device performance starting at about 600/spl deg/C. An identification (ID) tag on La/sub 3/Ga/sub 5/SiO/sub 14/, could be used as a wireless passive thermometer for measuring high temperatures in industrial process control applications.

E. Born

Papers

Defect structure of epitaxial GaN films determined by transmission electron microscopy and triple-axis X-ray diffractometry

Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films

Sound velocity of AlxGa1−xN thin films obtained by surface acoustic-wave measurements

Surface acoustic wave sensors for high-temperature applications

Langasite for High Temperature Surface Acoustic Wave Applications