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R. Höpler

Researcher at Technische Universität München

Publications -  8
Citations -  1500

R. Höpler is an academic researcher from Technische Universität München. The author has contributed to research in topics: Band gap & Molecular beam epitaxy. The author has an hindex of 6, co-authored 8 publications receiving 1388 citations.

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Optical constants of epitaxial AlGaN films and their temperature dependence

TL;DR: In this paper, the authors studied the dependence of the absorption edge and the refractive index of wurtzite AlxGa1−xN films on temperature and composition using transmission and photothermal deflection spectroscopy.
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Defect structure of epitaxial GaN films determined by transmission electron microscopy and triple-axis X-ray diffractometry

TL;DR: In this article, the correlation lengths and dislocation densities of hexagonal GaN grown by metallorganic chemical vapour deposition on c-plane sapphire are determined by transmission electron microscopy and triple-axis X-ray diffractometry.
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Determination of the Al mole fraction and the band gap bowing of epitaxial AlxGa1−xN films

TL;DR: In this article, the exact Al mole fraction and the biaxial strain of the alloys can be calculated by an additional determination of a, using asymmetric reflections, and the results obtained by x-ray diffraction and elastic recoil detection provide evidence for the validity of Vegard's law in the AlGaN system.
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Raman study of the optical phonons in AlxGa1−xN alloys

TL;DR: In this paper, the authors studied the Raman spectra of AlxGa1−xN layers grown by molecular beam epitaxy on sapphire substrates and determined the energy of the optical modes and the broadening of Raman peaks as a function of aluminum content.
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Properties and applications of MBE grown AlGaN

TL;DR: In this article, the authors used spin resonance to study the dependence of intrinsic paramagnetic defects on Al mole fraction and found that doping with Si and Mg is increasingly difficult with increasing Al content because of a continuous shift of the donor and acceptor levels deeper into the bandgap.