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Frank Schoofs

Researcher at United Kingdom Atomic Energy Authority

Publications -  25
Citations -  856

Frank Schoofs is an academic researcher from United Kingdom Atomic Energy Authority. The author has contributed to research in topics: Thin film & Atom probe. The author has an hindex of 12, co-authored 25 publications receiving 717 citations. Previous affiliations of Frank Schoofs include University of Cambridge & Harvard University.

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A correlated nickelate synaptic transistor.

TL;DR: The demonstration of a synaptic transistor with SmNiO₃, a correlated electron system with insulator-metal transition temperature at 130°C in bulk form, and synaptic spike-timing-dependent plasticity learning behaviour is realized.
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Charge confinement and doping at LaAlO3/SrTiO3 interfaces.

TL;DR: It is shown that the majority of the carriers in fully-oxygenated samples are confined within 1 unit cell of the interface, confirming the "polar-catastrophe" mechanism proposed for this system but the low mobility of these carriers demonstrates the need for improved materials for applications and a more complete understanding of the role of the minority of higher mobility carriers identified.
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Hall effect measurements on epitaxial SmNiO 3 thin films and implications for antiferromagnetism

TL;DR: In this article, the authors present temperature-dependent transport measurements of the resistivity, magnetoresistance, Seebeck coefficient, and Hall coefficient of rare earth nickelates with varying oxygen stoichiometry.
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High pressure synthesis of SmNiO3 thin films and implications for thermodynamics of the nickelates

TL;DR: In this article, the synthesis of rare earth nickelates (LnNiO3, Ln = lanthanide) on oxidized silicon wafers by physical vapor deposition followed by high pressure oxygen annealing at intermediate temperatures is reported.
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Carrier density modulation by structural distortions at modified LaAlO3/SrTiO3 interfaces

TL;DR: It is proposed that the 'structural reconstruction' which occurs in the STO surface as a result of the stress in the LAO is the enabling trigger for two-dimensional conduction at theLAO/STO interface by locally changing the band structure and releasing trapped carriers.