G
Guanxiong Liu
Researcher at University of California, Riverside
Publications - 67
Citations - 4642
Guanxiong Liu is an academic researcher from University of California, Riverside. The author has contributed to research in topics: Graphene & Noise (electronics). The author has an hindex of 33, co-authored 64 publications receiving 4105 citations. Previous affiliations of Guanxiong Liu include IBM.
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The influence of chemical reactivity of surface defects on ambient-stable InSe-based nanodevices.
Antonio Politano,Gennaro Chiarello,R. Samnakay,Guanxiong Liu,Bekir Gürbulak,Songül Duman,Alexander A. Balandin,Danil W. Boukhvalov,Danil W. Boukhvalov +8 more
TL;DR: It is demonstrated that, in contrast to most two-dimensional materials, ultrathin flakes of InSe are stable under ambient conditions, despite their ambient stability, InSe-based nanodevices show an environmental p-type doping, suppressed by capping InSe with hexagonal boron nitride.
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Flicker Noise in Bilayer Graphene Transistors
Qinghui Shao,Guanxiong Liu,Desalegne Teweldebrhan,Alexander A. Balandin,S. Roumyantesv,Michael Shur,D. Yan +6 more
TL;DR: The results of the experimental investigation of the low frequency noise in bilayer graphene transistors were presented in this paper, where the back-gated devices were fabricated using the electron beam lithography and evaporation.
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Direct Probing of 1/f Noise Origin with Graphene Multilayers: Surface vs. Volume
TL;DR: In this article, the authors used high-quality graphene multilayers to directly address the fundamental problem of the noise origin, and found that 1/f noise becomes dominated by the volume noise when the thickness exceeds 7 atomic layers (~2.5 nm).
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Tuning of Graphene Properties via Controlled Exposure to Electron Beams
TL;DR: In this article, the authors describe a possibility of tuning electrical properties of graphene via electron-beam (e-beam) irradiation and show that by controlling the irradiation dose one can change the carrier mobility and increase the resistance at the minimum conduction point in the single layer graphene.
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Breakdown current density in h-BN-capped quasi-1D TaSe3 metallic nanowires: prospects of interconnect applications
Maxim A. Stolyarov,Guanxiong Liu,Matthew A. Bloodgood,Ece Aytan,C. Jiang,R. Samnakay,Tina T. Salguero,Denis L. Nika,Denis L. Nika,Sergey L. Rumyantsev,Michael Shur,Krassimir N. Bozhilov,Alexander A. Balandin +12 more
TL;DR: The quasi-1D van der Waals metal tantalum triselenide capped with quasi-2D boron nitride was used to fabricate the mm-long TaSe3 wires with the lateral dimensions in the 20 to 70 nm range as mentioned in this paper.