H
Harith Ahmad
Researcher at University of Malaya
Publications - 1197
Citations - 14394
Harith Ahmad is an academic researcher from University of Malaya. The author has contributed to research in topics: Fiber laser & Laser. The author has an hindex of 45, co-authored 1126 publications receiving 11904 citations. Previous affiliations of Harith Ahmad include Airlangga University & University of Glasgow.
Papers
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Journal ArticleDOI
S – C – L triple wavelength superluminescent source based on an ultra-wideband SOA and FBGs
TL;DR: In this article, a wideband semiconductor optical amplifier (SOA) based triple-wavelength superluminescent source with the output in the S-, C- and L-band regions is proposed and demonstrated.
Journal ArticleDOI
Polarization response of planarized optical waveguides to determine the anisotropic complex refractive index of graphene oxide thin films.
Soon Xin Gan,Wen Sin Chong,Chon-Kit Lai,Wu Yi Chong,Steve Madden,M. Y. Choi,R.M. De La Rue,Harith Ahmad +7 more
TL;DR: In this paper , the complex refractive indices of planarized optical waveguides for both TE- and TM-polarized light at a wavelength of 1550 nm were found to be 1.71 + 0.09i and 1.58+0.05i, respectively.
Journal ArticleDOI
Gain-clamped erbium-doped fibre amplifier for wavelength division multiplexed systems
TL;DR: In this article, a gain-clamped erbium-doped fiber amplifier (EDFA) is proposed to solve the issue of gain tilt, a measure of maximum gain difference, and the suitability of the configuration is investigated through a numerical model, which is developed based on the standard EDFA and fiber laser models.
Proceedings ArticleDOI
Optical non-contact micrometer thickness measurement system for silica thick films
TL;DR: In this article, a novel optical approach is proposed and demonstrated for the non-contact measurement for the thickness of silica thick films based on the principal of an optical based displacement sensor.
Proceedings ArticleDOI
Inductively coupled plasma of fluorocarbon plasma glass etching process on planar lightwave circuit device fabrication
TL;DR: In this article, the profile and etch depth of a silica waveguide channel were inspected and measured with microscope and surface profiler respectively, and it was agreed with process knowledge that fluorocarbon etch gas C2F6 is better than CF4 and suit the need for planar lightwave circuit silica etching process.