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Showing papers by "Howard A. Padmore published in 2021"


Journal ArticleDOI
TL;DR: Urdiroz et al. as discussed by the authors measured the dispersion relationship and group velocities corresponding to spin waves excited at both the non-irradiated and the irradiated regions.
Abstract: Author(s): Urdiroz, U; Muller, C; Gomez, A; Magaz, MT; Granados, D; Sanchez Agudo, M; Rubio-Zuazo, J; Castro, GR; Stan, C; Tamura, N; Padmore, HA; Cebollada, F; Palomares, FJ; McCord, J; Gonzalez, JM | Abstract: We report on the measurement of the local magnetization dynamics occurring, at units of GHz, in large aspect ratio stripes lithographed from reduced damping amorphous Fe80B20 films. The stripes were submitted to local anisotropy modifications by micrometric beam synchrotron X-ray irradiation. Our results include data on the dispersion relationships and group velocities corresponding to spin waves excited at both the non-irradiated and the irradiated regions. Whereas in the former case we observed standing spin waves with transverse-to-the stripe axis wave vector, in the latter one, for which the wave vector of the spin waves was parallel-to-the stripe axis, propagating spin waves were excited. In both regions, we measured the effective propagation distance of the spin waves, which resulted to be independent of the wave vector orientation. In the spin waves excited at the irradiated region, we also measured the decay time and effective damping coefficient, which was in good agreement with previously reported values obtained from FMR measurements in amorphous Fe80B20 continuous films. We show that the interaction of the non-irradiated and irradiated zones results, at the stripe transverse saturation remanence and under an exciting field frequency of 4 GHz, in the introduction of a π phase shift between the standing spin waves excited at both sides of the irradiated region. This result opens the possibility of using the local, transverse to the stripe axis, magnetic anisotropy easy axis induced by the X-ray irradiation as a crucial constituent of a zero-applied field spin wave phase-shifter.

7 citations



Journal ArticleDOI
TL;DR: An advanced process for blaze angle reduction of x-ray gratings for the soft, tender, and EUV spectral ranges is developed based on planarization of an anisotropically etched Si blazed grating followed by a chemically selective plasma etch.
Abstract: We have developed an advanced process for blaze angle reduction of x-ray gratings for the soft, tender, and EUV spectral ranges. The process is based on planarization of an anisotropically etched Si blazed grating followed by a chemically selective plasma etch. This provides a way to adjust the blaze angle to any lower value with high accuracy. Here we demonstrate the reduction of the blaze angle to an extremely low value of 0.04°±0.004°. For a 100 lines/mm grating with a Mo/Si multilayer coating, the grating exhibits diffraction efficiency of 58% in the 1st diffraction order at a wavelength of 13.3 nm. This technique will be applicable to a wide range of uses of high efficiency gratings for synchrotron sources, as well as for Free Electron Lasers (FEL).

2 citations


Journal ArticleDOI
TL;DR: In this paper, local anisotropy modifications in amorphous Fe80B20 stripes prepared by laser lithography from 15nm thick films deposited by pulsed laser ablation are reported.

2 citations


Journal ArticleDOI
TL;DR: In this paper, a new type of optical element that can focus a cylindrical wave to a point focus (or vice versa) is analytically described, which provides completely aberration free, point-to-point imaging of rays from the on-axis source point.
Abstract: A new type of optical element that can focus a cylindrical wave to a point focus (or vice versa) is analytically described. Such waves are, for example, produced in a beamline where light is collimated in one direction and then doubly focused by a single optic. A classical example in X-ray optics is the collimated two-crystal monochromator, with toroidal mirror refocusing. The element here replaces the toroid, and in such a system provides completely aberration free, point-to-point imaging of rays from the on-axis source point. We present an analytic solution for the mirror shape in its laboratory coordinate system with zero slope at the centre, and approximate solutions, based on bending an oblique circular cone and a bent right circular cylinder, that may facilitate fabrication and metrology.

2 citations


Journal ArticleDOI
TL;DR: In this paper, the numerical implementation of diaboloid mirrors is described, and the benefit of this mirror in beamlines exploiting diffraction-limited storage rings is studied by ray tracing.
Abstract: The diaboloid is a reflecting surface that converts a spherical wave to a cylindrical wave. This complex surface may find application in new Advanced Light Source bending-magnet beamlines or in other beamlines that now use toroidal optics for astigmatic focusing. Here, the numerical implementation of diaboloid mirrors is described, and the benefit of this mirror in beamlines exploiting diffraction-limited storage rings is studied by ray tracing. The use of diaboloids becomes especially interesting for the new low-emittance storage rings because the reduction of aberration becomes essential for such small sources. The validity of the toroidal and other mirror surfaces approximating the diaboloid, and the effect of the mirror magnification, are discussed.

2 citations


DOI
01 Aug 2021
TL;DR: In this paper, the authors conduct photoconductivity measurements to measure fundamental semiconductor properties as well as using atomic force microscope (AFM) and kelvin probe force microscopy (KPFM) to measure the nanostructure variations in structure and surface potential.
Abstract: Alkali-antimonides, characterized by high quantum efficiency and low mean transverse energy in visible light, are excellent electron sources to drive x-ray free electron lasers, electron cooling and ultrafast electron diffraction applications etc. Existing studies of alkali-antimonides have focused on quantum efficiency and emittance, but information is lacking on the fundamental aspects of the electronic structure, such as the energy gap of the semiconductor and the density of defects as well as the overall nano-structure of the materials. We are, therefore, conducting photoconductivity measurements to measure fundamental semiconductor properties as well as using atomic force microscope (AFM) and kelvin probe force microscope (KPFM) to measure the nanostructure variations in structure and surface potential.

1 citations



DOI
01 Aug 2021
TL;DR: In this article, the authors report on nonlinear, nearthreshold photoemission from a Cu (100) cathode, and its affect on the mean transverse energy (MTE) of the cathode.
Abstract: Photocathodes that have a low mean transverse energy (MTE) are crucial to the development of compact X-ray Free Electron Lasers (XFEL) and ultrafast electron diffraction (UED) experiments. For FELs, low MTE cathodes result in a lower requirement for electron energy when lasing at a defined energy, and for a defined electron energy result in lasing at higher energy. For UED experiments, low MTE cathodes give a longer coherence length, allowing measurements on larger unit cell materials. A record low MTE of 5 meV has been recently demonstrated from a Cu (100) surface when measured near the photoemission threshold and cooled down to 30 K with liquid Helium [1]. For UED and XFEL applications that require a high charge density, the low quantum efficiency (QE) of Cu (100) near threshold necessitates the use of a high laser fluence to achieve the desired charge density [2]. At high laser fluences the MTE is limited by nonlinear effects, and therefore it is necessary to investigate near photoemission threshold at these high laser fluences. In this paper we report on nonlinear, nearthreshold photoemission from a Cu (100) cathode, and its affect on the MTE.

Proceedings ArticleDOI
21 Sep 2021
TL;DR: In this paper, a coarse Si grating with a blaze angle of 4° is planarized by a polymer layer and then plasma etching is applied to remove the polymer and underlying silicon material.
Abstract: Low groove density gratings with blaze angles as low as 0.1‡ are required for plane grating monochromators for x-ray synchrotron and Free Electron Laser applications. To achieve so small a blaze angles we developed a process of reduction of the blaze angle of a coarse Si grating fabricated by anisotropic wet etching. The coarse grating with a blaze angle of 4° is planarized by a polymer layer and then plasma etching is applied to remove the polymer and underlying silicon material. The appropriate ratio of etch rates of Si and the polymer material provides reduction of the groove depth and the blaze angle. We developed a set of reduction recipes which provide blaze angle reduction down to 0.04° with high accuracy and which preserves the perfect triangular shape of the grooves. The ultra-low blaze angle grating coated with a Mo/Si multilayer exhibits a record diffraction efficiency of 58% due to the perfect match of the groove depth with the multilayer d-spacing. This opens up wide possibilities for making highly accurate and efficient diffraction gratings for tender x-ray, free electron laser, and EUV lithography applications. The low blaze angle gratings have a perfect triangular groove profile and highly smooth surfaces of the blazed facets which ensures high diffraction efficiency of the x-ray gratings.