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Jiaxin Wang

Researcher at Peking University

Publications -  39
Citations -  428

Jiaxin Wang is an academic researcher from Peking University. The author has contributed to research in topics: Field-effect transistor & Transistor. The author has an hindex of 10, co-authored 39 publications receiving 351 citations.

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An Analytical Surface Potential Model Accounting for the Dual-Modulation Effects in Tunnel FETs

TL;DR: In this paper, an analytical model of the channel surface potential in the tunnel field effect transistors (TFETs) is established and verified, and the transition point corresponding to the switching between the two operating regimes is also analyzed quantitatively.
Journal ArticleDOI

A Novel Tunnel FET Design With Stacked Source Configuration for Average Subthreshold Swing Reduction

TL;DR: In this paper, a novel heterostacked tunnel FET (HS-TFET) is proposed for steeper average sub-threshold swing (SS), which owns a stacked source configuration consisting of an upper source layer with a relatively larger bandgap material and an underlying layer with smaller bandgap materials.
Proceedings ArticleDOI

Comprehensive performance re-assessment of TFETs with a novel design by gate and source engineering from device/circuit perspective

TL;DR: In this paper, a pocket-mSTFET (PMS-TFET) is proposed and experimentally demonstrated by evaluating the performance from device metrics to circuit implementation for low-power SoC applications.
Journal ArticleDOI

Vertical WS 2 /SnS 2 van der Waals Heterostructure for Tunneling Transistors

TL;DR: The optimal 2D-2D heterostructure for tunneling transistors is presented and elaborately engineered, taking into consideration both electric properties and material stability, and can guide possible development of energy-efficient future-generation electronics.
Proceedings ArticleDOI

First foundry platform of complementary tunnel-FETs in CMOS baseline technology for ultralow-power IoT applications: Manufacturability, variability and technology roadmap

TL;DR: In this paper, complementary tunnel-FETs (C-TFETs) are integrated with CMOS foundry for high volume production, demonstrating an intrinsic tradeoff between performance enhancement and variability suppression induced by dominant variation source in traditional TFETs.