J
Jörg Schilling
Researcher at Martin Luther University of Halle-Wittenberg
Publications - 66
Citations - 2939
Jörg Schilling is an academic researcher from Martin Luther University of Halle-Wittenberg. The author has contributed to research in topics: Photonic crystal & Silicon. The author has an hindex of 23, co-authored 65 publications receiving 2723 citations. Previous affiliations of Jörg Schilling include California Institute of Technology & Max Planck Society.
Papers
More filters
Journal ArticleDOI
Polymer nanotubes by wetting of ordered porous templates.
Martin Steinhart,Joachim H. Wendorff,Andreas Greiner,Ralf B. Wehrspohn,Kornelius Nielsch,Jörg Schilling,Jinsub Choi,Ulrich Gösele +7 more
TL;DR: A simple technique for the fabrication of polymer nanotubes with a monodisperse size distribution and uniform orientation is developed, and this approach should be a promising route toward functionalized polymer Nanotubes.
Journal ArticleDOI
Metamaterial-inspired silicon nanophotonics
Isabelle Staude,Jörg Schilling +1 more
TL;DR: In this paper, a review of recent progress on metamaterial-inspired silicon nanostructures, including Mie-resonant and off-Resonant regimes, is presented.
Journal ArticleDOI
Perfect two-dimensional porous alumina photonic crystals with duplex oxide layers
TL;DR: In this paper, a perfect two-dimensional porous alumina photonic crystal with 500 nm interpore distance was fabricated on an area of 4 cm2 via imprint methods and subsequent electrochemical anodization.
Journal ArticleDOI
Ultrafast band-edge tuning of a two-dimensional silicon photonic crystal via free-carrier injection
TL;DR: In this article, the band edge of a two-dimensional silicon/air photonic crystal has been shown to shift linearly with pump beam fluence, with a shift in excess of 30 nm for a pump beam beamfluence of 2 mJ cm 22.
Journal ArticleDOI
Second‐Order Optical Nonlinearity in Silicon Waveguides: Inhomogeneous Stress and Interfaces
Clemens Schriever,Federica Bianco,Federica Bianco,Massimo Cazzanelli,Mher Ghulinyan,Christian Eisenschmidt,Johannes de Boor,Alexander Schmid,Johannes Heitmann,Lorenzo Pavesi,Jörg Schilling +10 more
TL;DR: In this paper, the influence of the stress and the stressing silicon nitride layer using second harmonic generation measurements in transmission is investigated, and it is shown that the enhancement of the second-order nonlinearity arises from a constructive superposition of stress-induced and interface-related effects.