K
Kenji Taniguchi
Researcher at Osaka University
Publications - 265
Citations - 2618
Kenji Taniguchi is an academic researcher from Osaka University. The author has contributed to research in topics: CMOS & Silicon. The author has an hindex of 26, co-authored 265 publications receiving 2549 citations.
Papers
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A study of photon emission from n-channel MOSFET's
TL;DR: In this article, the spectral distribution of the emitted light of an n-channel MOSFET operating in the saturation region has been investigated for the first time, and the energy state of hot electrons is described as a Maxwell-Boltzmann distribution.
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Study of interface roughness dependence of electron mobility in Si inversion layers using the Monte Carlo method
Shinya Yamakawa,Hiroaki Ueno,Kenji Taniguchi,Chihiro Hamaguchi,Kazuo Miyatsuji,Kazuo Masaki,Umberto Ravaioli +6 more
TL;DR: In this paper, the electron mobility in the inversion layer of a metal-oxide semiconductor field effect transistor formed on the (100) silicon surface is calculated by using a Monte Carlo approach which takes into account size quantization, acoustic phonon scattering, intervalley phonon and surface roughness scattering.
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Electroreflectance Study of CdxHg1-xTe
TL;DR: In this article, the electroreflectance of Cd x Hg 1-x Te alloys for x from 0 to 0.70 and for x = 0.97 and x = 1 was measured by the electrolyte technique in the range of photon energy 0.5 to 6 eV at room temperature.
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Theoretical model for self‐interstitial generation at the Si/SiO2 interface during thermal oxidation of silicon
TL;DR: Using a grating pattern of parallel nitride and oxide stripes on the silicon surface, self-interstitial concentration at the Si/SiO2 interface is accurately determined by means of oxidation-induced stacking fault growth observation as discussed by the authors.
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A new soft breakdown model for thin thermal SiO/sub 2/ films under constant current stress
TL;DR: In this paper, the authors investigated the soft breakdown properties of thin gate oxide films using a constant current stress measurement and showed that all types of breakdown originate from the same precursor and the magnitude of the following local heating due to the transient current in a conductive micro spot determines the charge conduction properties after a breakdown event.