K
Ki-Jeong Kim
Researcher at Pohang University of Science and Technology
Publications - 101
Citations - 2538
Ki-Jeong Kim is an academic researcher from Pohang University of Science and Technology. The author has contributed to research in topics: X-ray photoelectron spectroscopy & Graphene. The author has an hindex of 23, co-authored 95 publications receiving 2001 citations. Previous affiliations of Ki-Jeong Kim include Sookmyung Women's University & KAIST.
Papers
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Journal ArticleDOI
Thickness-dependent reversible hydrogenation of graphene layers.
Zhiqiang Luo,Ting Yu,Ki-Jeong Kim,Zhenhua Ni,Yumeng You,San Hua Lim,Zexiang Shen,Shanzhong Wang,Jianyi Lin +8 more
TL;DR: Hydrogen coverage investigation and micro-X-ray photoelectron spectroscopy characterization demonstrates that the hydrogenation of single layer graphene on SiO(2)/Si substrate is much less feasible than that of bilayer and multilayer graphene.
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Understanding how excess lead iodide precursor improves halide perovskite solar cell performance
Byung-wook Park,Nir Kedem,Michael Kulbak,Do Yoon Lee,Woon Seok Yang,Nam Joong Jeon,Jangwon Seo,Geonhwa Kim,Geonhwa Kim,Ki-Jeong Kim,Tae Joo Shin,Gary Hodes,David Cahen,Sang Il Seok +13 more
TL;DR: The underlying microscopic mechanism to be promoting the oriented growth of the perovskites crystals and reducing the defect concentration is unveiled, and the role of lead iodide is proposed.
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Absolute Surface Density of the Amine Group of the Aminosilylated Thin Layers: Ultraviolet−Visible Spectroscopy, Second Harmonic Generation, and Synchrotron-Radiation Photoelectron Spectroscopy Study
Joong Ho Moon,Jin Ho Kim,Ki-Jeong Kim,Tai-Hee Kang,Bongsoo Kim,Chan-Ho Kim,Jong Hoon Hahn,Joon Won Park +7 more
TL;DR: In this article, the surface of a fused silica and oxidized silicon wafer (SiO2/Si(100)) was treated with (3-aminopropyl)triethoxysilane (1), (3-) aminosilane, (3)-amino-methyl-silane (2), and (3]-ethoxydimethylsilane for 72 h in solution.
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Ultralow-dielectric-constant amorphous boron nitride
Seokmo Hong,Chang-Seok Lee,Min-Hyun Lee,Yeongdong Lee,Kyung Yeol Ma,Gwangwoo Kim,Seong In Yoon,Kyuwook Ihm,Ki-Jeong Kim,Tae Joo Shin,Sang Won Kim,Eun chae Jeon,Hansol Jeon,Ju-Young Kim,Hyung Ik Lee,Zonghoon Lee,Aleandro Antidormi,Stephan Roche,Stephan Roche,Manish Chhowalla,Hyeon-Jin Shin,Hyeon Suk Shin +21 more
TL;DR: Th Thin films of amorphous boron nitride are mechanically and electrically robust, prevent diffusion of metal atoms into semiconductors and have ultralow dielectric constants that exceed current recommendations for high-performance electronics.
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Covalent Functionalization of Epitaxial Graphene by Azidotrimethylsilane
TL;DR: In this paper, a high-resolution photoemission spectroscopy (HRPES) was used to confirm that EG is modified by thermally generated nitrene radicals and found that the bonding nature between the nitrene radical and EG is covalent.