The semiconductor ZnO has gained substantial interest in the research community in part because of its large exciton binding energy (60meV) which could lead to lasing action based on exciton recombination even above room temperature. Even though research focusing on ZnO goes back many decades, the renewed interest is fueled by availability of high-quality substrates and reports of p-type conduction and ferromagnetic behavior when doped with transitions metals, both of which remain controversial. It is this renewed interest in ZnO which forms the basis of this review. As mentioned already, ZnO is not new to the semiconductor field, with studies of its lattice parameter dating back to 1935 by Bunn [Proc. Phys. Soc. London 47, 836 (1935)], studies of its vibrational properties with Raman scattering in 1966 by Damen et al. [Phys. Rev. 142, 570 (1966)], detailed optical studies in 1954 by Mollwo [Z. Angew. Phys. 6, 257 (1954)], and its growth by chemical-vapor transport in 1970 by Galli and Coker [Appl. Phys. ...

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A comprehensive review of zno materials and devices

We present a review of current research on the optical properties of ZnO nanostructures. We provide a brief introduction to different fabrication methods for various ZnO nanostructures and some general guidelines on how fabrication parameters (temperature, vapor-phase versus solution-phase deposition, etc.) affect their properties. A detailed discussion of photoluminescence, both in the UV region and in the visible spectral range, is provided. In addition, different gain (excitonic versus electron hole plasma) and feedback (random lasing versus individual nanostructures functioning as Fabry-Perot resonators) mechanisms for achieving stimulated emission are described. The factors affecting the achievement of stimulated emission are discussed, and the results of time-resolved studies of stimulated emission are summarized. Then, results of nonlinear optical studies, such as second-harmonic generation, are presented. Optical properties of doped ZnO nanostructures are also discussed, along with a concluding outlook for research into the optical properties of ZnO.

Optical properties of ZnO nanostructures.

Recent progress in processing and properties of ZnO

A review is given of recent results in developing improved fabrication processes for ZnO devices with the possible application to UV light emitters, spin functional devices, gas sensors, transparent electronics, and surface acoustic wave devices. There is also interest in integrating ZnO with other wide band-gap semiconductors, such as the AlInGaN system. In this article, we summarize recent progress in controlling n- and p-type doping, materials processing methods, such as ion implantation for doping or isolation, Ohmic and Schottky contact formation, plasma etching, the role of hydrogen in the background n-type conductivity of many ZnO films, and finally, the recent achievement of room-temperature ferromagnetism in transition-metal (Mn or Co)-doped ZnO. This may lead to another class of spintronic devices, in which the spin of the carriers is exploited rather than the charge as in more conventional structures.

Recent advances in processing of ZnO

We report on the electrical characterization of single-crystal ZnO and Au Schottky contacts formed thereon before and after bombarding them with 1.8 MeV protons. From capacitance–voltage measurements, we found that ZnO is remarkably resistant to high-energy proton bombardment and that each incident proton removes about two orders of magnitude less carriers than in GaN. Deep level transient spectroscopy indicates a similar effect: the two electron traps detected are introduced in extremely low rates. One possible interpretation of these results is that the primary radiation-induced defects in ZnO may be unstable at room temperature and anneal out without leaving harmful defects that are responsible for carrier compensation.

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Electrical Characterization of 1.8 MeV Proton-Bombarded ZnO

Gold Schottky-barrier diodes (SBDs) were fabricated on vapor-phase-grown single-crystal ZnO. Deep-level transient spectroscopy, using these SBDs, revealed the presence of four electron traps, the major two having levels at 0.12 eV and 0.57 below the conduction band. Comparison with temperature-dependent Hall measurements suggests that the 0.12 eV level has a temperature activated capture cross section with a capture barrier of about 0.06 eV and that it may significantly contribute to the free-carrier density. Based on the concentrations of defects other than this shallow donor, we conclude that the quality of the vapor-phase-grown ZnO studied here supercedes that of other single-crystal ZnO reported up to now.

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Electrical Characterization of Vapor-Phase-Grown Single-Crystal ZnO

Metal-oxide-semiconductor (MOS) structures were formed on n-ZnO and the electrical properties were compared to Au Schottky barrier diodes (SBDs) on similar ZnO. After evaporating Ni onto either ZnO, Si or glass, the thin films were oxidised to produce transparent, resisitive layers. The structure and composition of these layers were studied by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and electron microscopy. The electrical properties were investigated by variable temperature current–voltage ( I – V ) and four-point probe measurements, whereas the optical properties were investigated by photospectrometry. The influence of oxidation temperature on the resistivity of the nickel oxide layers was used to optimise the processing conditions. NiO layers had a maximum resistivity of approximately 100 Ω cm after oxidation and bandgap of 3.5–3.6 eV at room temperature. The rectifying qualities of the junctions (using Pd gates) were sufficient for DLTS measurements of ZnO in the temperature range 20–390 K.

Fabrication and characterisation of NiO/ZnO structures

The Israel Ministry of
 Science’s Tashtiot program.and the NRF Nanotechnology Flagship
 Program (Project No. 88021).

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Laplace current deep level transient spectroscopy measurements of defect states in methylammonium lead bromide single crystals

Effects of annealing ZnO in hydrogen, oxygen, and argon have been investigated using deep level transient spectroscopy (DLTS) and Laplace-DLTS (LDLTS) measurements. Current-voltage (IV) measurements indicate a decrease in zero–bias barrier height for all the annealed samples. Conventional DLTS measurements reveal the presence of three prominent peaks in the un-annealed and annealed samples. A new peak with an activation enthalpy of 0.60 eV has been observed in the H2 annealed samples, while an estimated energy level of 0.67 eV has been observed in Ar annealed samples. O2 annealing does not introduce new peaks but causes a decrease in the concentration of the E3 peak and an increase in concentration of the E1 peak. The concentrations of all the intrinsic defects have decreased after H2 and Ar annealing; with Ar annealing giving peaks with the lowest concentrations. The E2 peak anneals out after annealing ZnO in Ar and H2 at 300 °C. From the annealing behaviour of E3, we have attributed to transition metal ...

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Effects of hydrogen, oxygen, and argon annealing on the electrical properties of ZnO and ZnO devices studied by current-voltage, deep level transient spectroscopy, and Laplace DLTS

M.J. Legodi

Papers

Electrical Characterization of 1.8 MeV Proton-Bombarded ZnO

Electrical Characterization of Vapor-Phase-Grown Single-Crystal ZnO

Fabrication and characterisation of NiO/ZnO structures

Laplace current deep level transient spectroscopy measurements of defect states in methylammonium lead bromide single crystals

Effects of hydrogen, oxygen, and argon annealing on the electrical properties of ZnO and ZnO devices studied by current-voltage, deep level transient spectroscopy, and Laplace DLTS