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M

M. Stadele

Researcher at Infineon Technologies

Publications -  42
Citations -  1131

M. Stadele is an academic researcher from Infineon Technologies. The author has contributed to research in topics: Quantum tunnelling & MOSFET. The author has an hindex of 17, co-authored 42 publications receiving 1104 citations. Previous affiliations of M. Stadele include University of Illinois at Urbana–Champaign.

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Electronic structure of ScN determined using optical spectroscopy, photoemission, and ab initio calculations

TL;DR: In this paper, it was shown that ScN is a semiconductor rather than a semimetal with a band gap larger than 2 eV, which is the smallest known band gap for any semiconductor.
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Metallization of molecular hydrogen: predictions from exact-exchange calculations.

TL;DR: This work studies metallization of molecular hydrogen under pressure using exact-exchange (EXX) Kohn-Sham density-functional theory in order to avoid well-known underestimates of band gaps associated with standard local-density or generalized-gradient approximations.
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Tunneling through ultrathin SiO2 gate oxides from microscopic models

TL;DR: In this article, theoretically coherent electron tunneling through three-dimensional microscopic Si[100]/SiO2/Si[100]-model junctions with oxide thicknesses between 0.4 and 4.6 nm was investigated.
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Simulation of nanoscale MOSFETs using modified drift-diffusion and hydrodynamic models and comparison with Monte Carlo results

TL;DR: In this article, the dc behavior of single-gate and double-gate MOSFETs with gate lengths ranging from 5 to 100nm is simulated using drift-diffusion, hydrodynamic, and Monte Carlo approaches.
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Exact-exchange-based quasiparticle calculations

TL;DR: In this article, one-particle wave functions and energies from Kohn-Sham calculations with the exact local KohnSham exchange and the local density approximation (LDA) correlation potential [EX(c)] are used as input for quasiparticle calculations in the GW approximation (GWA) for eight semiconductors.