K
Kenneth Järrendahl
Researcher at Linköping University
Publications - 101
Citations - 1598
Kenneth Järrendahl is an academic researcher from Linköping University. The author has contributed to research in topics: Ellipsometry & Thin film. The author has an hindex of 19, co-authored 100 publications receiving 1436 citations. Previous affiliations of Kenneth Järrendahl include North Carolina State University.
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A spectroscopic ellipsometry study of cerium dioxide thin films grown on sapphire by rf magnetron sputtering
TL;DR: In this paper, variable angle spectroscopic ellipsometry (VASE) has been used in the photon energy range 125-50 eV to study the structure and optical properties of cerium dioxide (CeO2) films.
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Electronic structure of ScN determined using optical spectroscopy, photoemission, and ab initio calculations
Daniel Gall,M. Stadele,Kenneth Järrendahl,Ivan Petrov,Patrick Desjardins,Richard T. Haasch,Taeyoon Lee,Joseph E Greene,Joseph E Greene +8 more
TL;DR: In this paper, it was shown that ScN is a semiconductor rather than a semimetal with a band gap larger than 2 eV, which is the smallest known band gap for any semiconductor.
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Chirality-induced polarization effects in the cuticle of scarab beetles: 100 years after Michelson
TL;DR: In this article, a novel Mueller-matrix ellipsometry setup allows unprecedented detailed characterization of the beacons' polarization in reflection from the beetles, and the results are used for the characterization of beacons.
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Growth of epitaxial aln(0001) on si(111) by reactive magnetron sputter-deposition
Ivan Ivanov,Lars Hultman,Kenneth Järrendahl,P. Mårtensson,J.-E. Sundgren,Björgvin Hjörvarsson,Joseph E Greene +6 more
TL;DR: In this article, the epitaxial relationship was found by XTEM and x-ray diffraction (XRD) to be 2H−AlN(0001)//3C-alN(111)//Si(111), with 2H-AlN[1210] −3C−alN[110] −Si[110].
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Multiple sample analysis of spectroscopic ellipsometry data of semi-transparent films
Kenneth Järrendahl,Hans Arwin +1 more
TL;DR: In this article, the authors applied the multiple sample analysis method to find dielectric functions, film thicknesses and surface roughness of thin films of Ta 2 O 5, ScN and CeO 2.