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Maksym Myronov

Researcher at University of Warwick

Publications -  255
Citations -  3388

Maksym Myronov is an academic researcher from University of Warwick. The author has contributed to research in topics: Quantum well & Silicon. The author has an hindex of 28, co-authored 251 publications receiving 2864 citations. Previous affiliations of Maksym Myronov include Tokyo City University.

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The germanium quantum information route

TL;DR: In the effort to develop disruptive quantum technologies, germanium is emerging as a versatile material to realize devices capable of encoding, processing and transmitting quantum information as mentioned in this paper, such as a universal quantum gate set with spin qubits in quantum dots and superconductor-semiconductor hybrid quantum systems.
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Band engineering and growth of tensile strained Ge/(Si)GeSn heterostructures for tunnel field effect transistors

TL;DR: In this paper, the authors proposed a heterostructure design for tunnel field effect transistors with two low direct bandgap group IV compounds, GeSn and highly tensely strained Ge in combination with ternary SiGeSn alloy.
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The germanium quantum information route

TL;DR: In this article, the physics of holes in low-dimensional germanium structures with key insights from a theoretical perspective are introduced and a review of the most significant experimental results demonstrating key building blocks for quantum technology, such as an electrically driven universal quantum gate set with spin qubits in quantum dots and superconducting pairing correlations.
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Ohmic contacts to n-type germanium with low specific contact resistivity

TL;DR: A low temperature nickel process has been developed that produces Ohmic contacts to n-type germanium with specific contact resistivities down to (23 −± 18) −7 Ω-cm2 for anneal temperatures of 340 −°C.
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Reverse graded relaxed buffers for high Ge content SiGe virtual substrates

TL;DR: In this paper, an innovative approach is proposed for epitaxial growth of high Ge content, relaxed Si1−xGex buffer layers on a Si(001) substrate.