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Marko J. Tadjer

Researcher at United States Naval Research Laboratory

Publications -  205
Citations -  7494

Marko J. Tadjer is an academic researcher from United States Naval Research Laboratory. The author has contributed to research in topics: Diamond & Breakdown voltage. The author has an hindex of 32, co-authored 189 publications receiving 4808 citations. Previous affiliations of Marko J. Tadjer include Technical University of Madrid & University of Maryland, College Park.

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A review of band structure and material properties of transparent conducting and semiconducting oxides: Ga2O3, Al2O3, In2O3, ZnO, SnO2, CdO, NiO, CuO, and Sc2O3

TL;DR: In this paper , a review of basic and transition metal conducting and semiconducting oxides is presented, with an emphasis on the crystal, electronic, and band structures of the oxides.
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Thermal conductance across β-Ga2O3-diamond van der Waals heterogeneous interfaces

TL;DR: In this article, the authors studied the thermal transport across the interfaces of Ga2O3 exfoliated onto a single crystal diamond and found that the van der Waals bonded temperature was 17 −1.7/+2.0 MW/m2 K, which is comparable to the TBC of several physical-vapor-deposited metals on diamond.
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Heterostructure WSe2-Ga2O3 Junction Field-Effect Transistor for Low-Dimensional High-Power Electronics.

TL;DR: This work demonstrated a heterostructure n-channel depletion-mode β-Ga2O3 junction field-effect transistor (JFET) through van der Waals bonding with an exfoliated p-WSe2 flake, enabling miniaturization of the integrated power electronic systems.
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Quasi-Two-Dimensional h-BN/β-Ga2O3 Heterostructure Metal–Insulator–Semiconductor Field-Effect Transistor

TL;DR: In this paper, β-gallium oxide (β-Ga2O3) and hexagonal boron nitride (h-BN) heterostructure-based quasi-two-dimensional metal-insulator-semiconductor field effect transistors (MISFETs) were demonstrated by integrating mechanical exfoliation of (quasi)-twodimensional materials with a dry transfer process, wherein nanothin flakes of β-Ga 2O3 and h-BN were utilized as the channel and gate dielectric, respectively, of the MISFET.