M
Mathias Irmscher
Researcher at STMicroelectronics
Publications - 68
Citations - 403
Mathias Irmscher is an academic researcher from STMicroelectronics. The author has contributed to research in topics: Resist & Lithography. The author has an hindex of 10, co-authored 68 publications receiving 385 citations.
Papers
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Journal ArticleDOI
Dry etch improvements in the SOI wafer flow process for IPL stencil mask fabrication
Florian Letzkus,Jörg Butschke,B. Höfflinger,Mathias Irmscher,Christian Reuter,Reinhard Springer,Albrecht Ehrmann,Josef Mathuni +7 more
TL;DR: The 4x ion projection lithography (IPL) was designed to reach sub-100nm resolution on the wafer plane, using stencil membrane masks out of 150mm SOI wafers as discussed by the authors.
Journal ArticleDOI
SOI wafer flow process for stencil mask fabrication
Jörg Butschke,Albrecht Ehrmann,B. Höfflinger,Mathias Irmscher,R. Käsmaier,Florian Letzkus,Hans Loschner,J. Mathuni,Christian Reuter,C. Schomburg,Reinhard Springer +10 more
TL;DR: In this article, a high yield fabrication process for stencil mask using SOI material is presented, where Membranes and masks from different base materials have been fabricated and the stress of the membrane, depending on the doping level, has been determined.
Journal ArticleDOI
Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning
Stefan Eder Kapl,Hans Loeschner,Walter Piller,Martin Witt,W. Pilz,Florian Letzkus,Michael Jurisch,Mathias Irmscher,Elmar Platzgummer +8 more
TL;DR: In this paper, an APS test stand was designed to achieve 0.08?rad for measuring lateral/angular beamlet movements, well below the target spec for the charged particle multi-beam projection technology.
Proceedings ArticleDOI
MAGIC: a European program to push the insertion of maskless lithography
Laurent Pain,B. Icard,S. Tedesco,B. J. Kampherbeek,G. Gross,Christof Klein,Hans Loeschner,Elmar Platzgummer,R. Morgan,S. Manakli,Johannes Kretz,C. Holhe,K.-H. Choi,F. Thrum,Elyakim Kassel,W. Pilz,Katja Keil,Jörg Butschke,Mathias Irmscher,Florian Letzkus,P. Hudek,A. Paraskevopoulos,P. Ramm,J. Weber +23 more
TL;DR: The present status of multi beam lithography is drawn and the content and the objectives of the MAGIC project are details.
Proceedings ArticleDOI
Projection maskless lithography (PML2): proof-of-concept setup and first experimental results
Christof Klein,Elmar Platzgummer,Hans Loeschner,G. Gross,P. Dolezel,M. Tmej,V. Kolarik,W. Klingler,Florian Letzkus,Jörg Butschke,Mathias Irmscher,M. Witt,W. Pilz +12 more
TL;DR: Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 32nm-node and beyond as mentioned in this paper, which is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel.