An object is to provide a semiconductor device of which a manufacturing process is not complicated and by which cost can be suppressed, by forming a thin film transistor using an oxide semiconductor film typified by zinc oxide, and a manufacturing method thereof. For the semiconductor device, a gate electrode is formed over a substrate; a gate insulating film is formed covering the gate electrode; an oxide semiconductor film is formed over the gate insulating film; and a first conductive film and a second conductive film are formed over the oxide semiconductor film. The oxide semiconductor film has at least a crystallized region in a channel region.

Semiconductor device, and manufacturing method thereof

An apparatus may include a semiconductor chip and a fluidics assembly. The semiconductor chip has an array of wells and an array of sensors and each sensor of the array of sensors is in fluid communication with a well of the array of wells. The fluidics assembly is located on top of the semiconductor chip and is configured to deliver fluids to the semiconductor chip. The fluidics assembly includes a flow expansion chamber configured to introduce the fluids, an outlet portion configured to pipe out the fluids, and a flow chamber portion. The flow chamber portion is configured to allow the fluids to flow from the flow expansion chamber to the outlet portion and to allow the fluids to interact along the way with material in the array of wells. The flow expansion chamber has a curved wall at the top or bottom so that the height of the flow expansion chamber at the center is less than at the walls that restrict the fluids to the left and right.

Methods and apparatus for measuring analytes using large scale fet arrays

In fabricating a thin film transistor, an active layer comprising a silicon semiconductor is formed on a substrate having an insulating surface Hydrogen is introduced into The active layer A thin film comprising SiO x N y is formed to cover the active layer and then a gate insulating film comprising a silicon oxide film formed on the thin film comprising SiO x N y  Also, a thin film comprising SiO x N y is formed under the active layer The active layer includes a metal element at a concentration of 1×10 15 to 1×10 19 cm −3 and hydrogen at a concentration of 2×10 19 to 5×10 21 cm −3 

Semiconductor device and method for forming the same

Is your memory hierarchy stopping your microprocessor from performing at the high level it should be? Memory Systems: Cache, DRAM, Disk shows you how to resolve this problem. The book tells you everything you need to know about the logical design and operation, physical design and operation, performance characteristics and resulting design trade-offs, and the energy consumption of modern memory hierarchies. You learn how to to tackle the challenging optimization problems that result from the side-effects that can appear at any point in the entire hierarchy.As a result you will be able to design and emulate the entire memory hierarchy. . Understand all levels of the system hierarchy -Xcache, DRAM, and disk. . Evaluate the system-level effects of all design choices. . Model performance and energy consumption for each component in the memory hierarchy.

Memory Systems: Cache, DRAM, Disk

Methods and apparatus relating to FET arrays including large FET arrays for monitoring chemical and/or biological reactions such as nucleic acid sequencing-by-synthesis reactions. Some methods provided herein relate to improving signal (and also signal to noise ratio) from released hydrogen ions during nucleic acid sequencing reactions.

Methods and apparatus for measuring analytes

Low-temperature (77K, 4.2K) operation is proposed for bulk CMOS devices to be used in superfast VLSI applications. Symmetrical variation of the parameters of both n-channel and p-channel MOSFETs with respect to the temperature and latch-up immunity makes CMOS a very promising device technology at low temperatures. To demonstrate the performance advantage of circuit operation at low temperatures, inverter chains and 16-kb static random-access memories (RAMs) with 2-/spl mu/m gate length were measured. Average propagation delay for an inverter chain has been reduced to 175 ps (77K) and 104 ps (4.2K) from 296 ps at 300K without sacrificing power dissipation. The power-delay product is less 1 fJ, which is the smallest for silicon devices reported to date. The chip select-access time of the RAM has been reduced to 14.3 ns (77K) from 24 ns (300K).

Operation of bulk CMOS devices at very low temperatures

A programmable semiconductor integrated circuitry including a circuit programming element is disclosed. The circuit programming element can be activated in a short-circuit mode by the irradiation of a laser or electron beam or by ion implantation so that it is converted from its original nonconductive state into a conductive or conductable state, thereby providing electrical connection between circuits and/or circuit elements of the integrated circuitry for a desired circuit programming such as circuit creation, circuit conversion or circuit substitution.

Programmable semiconductor integrated circuitry including a programming semiconductor element

A 1-Mbit CMOS static RAM (SRAM) with a typical address access time of 9 ns has been developed. A high-speed sense amplifier circuit, consisting of a three-stage PMOS cross-coupled sense amplifier with a CMOS preamplifier, is the key to the fast access time. A parallel-word-access redundancy architecture, which causes no access time penalty, was also incorporated. A polysilicon PMOS load memory cell, which had a large on-current-to-off-current ratio, gave a much lower soft-error rate than a conventional high-resistance polysilicon load cell. The 1-Mbit SRAM, fabricated using a half-micrometer, triple-poly, and double-metal CMOS technology, operated at a single supply voltage of 5 V. An on-chip power supply converter was incorporated in the SRAM to supply a partial internal supply voltage of 4 V to the high-performance half-micrometer MOS transistors. >

A 15-ns 1-Mbit CMOS SRAM

A protective circuit comprises a metal-oxide-semiconductor field effect transistor (MOSFET) to be protected, and a depletion-type MOSFET the gate and source of which are connected to each other and the souce of which is connected to the gate of the MOSFET to be protected, whereby the protective circuit which is suitable for a high-speed operation is completed.

Protective circuit and device for metal-oxide-semiconductor field effect transistor and method for fabricating the device

Herein disclosed is a semiconductor device having at least one lower resistance region formed in the single-crystalline semiconductor film which is so formed to continuously coat both a single-crystalline semiconductor substrate and an insulating film formed on the surface of the substrate Since the aforementioned single-crystalline semiconductor film is used, many advantages which are not attained from the semiconductor device according to the prior art can be obtained The aforementioned single-crystalline semiconductor film is formed by irradiating a polycrystalline or amorphous semiconductor film with a laser beam

Osamu Minato

Papers

Operation of bulk CMOS devices at very low temperatures

Programmable semiconductor integrated circuitry including a programming semiconductor element

A 15-ns 1-Mbit CMOS SRAM

Protective circuit and device for metal-oxide-semiconductor field effect transistor and method for fabricating the device

Method of making three dimensional semiconductor devices in selectively laser regrown polysilicon or amorphous silicon layers