P. Jin

TL;DR: In this paper, radio frequency sputtering has been used to deposit α-alumina (α-Al2O3) thin films at substrate temperatures of 280-560°C.

TL;DR: In this article, a description about low temperature deposition of a-Al2O3 thin films by sputtering was presented and a template was used as a template for nanoindentation.

TL;DR: SrTiO3 (STO) thin films were deposited on p-type Si(100) substrates by rf magnetron sputtering at various substrate temperatures, and their structural and electrical properties were investigated without post-deposition annealing as discussed by the authors.

TL;DR: Amorphous alumina films, approximately 600 nm in thickness, prepared on Si(100) substrates by RF magnetron sputtering were irradiated with 2.0 MeV Si + ions at a dose of 1×10 17 ions/cm 2 and the influence on the composition, microstructure, and mechanical properties was examined by Rutherford backscattering, X-ray diffraction and nanoindentation measurements as mentioned in this paper.

TL;DR: In this article, the authors used laser ablation and magnetron sputtering to obtain high quality zinc oxide (ZnO) films by using special devised optical geometry, and proved that the traditional resonant cavity is not imperative to form the lasing and that in-plane closed loop paths via multiple scattering between crystalline grains seems more suitable to account for the LAS mechanism.