Journal ArticleDOI
Influence of high-energy Si+ ion irradiation on microstructure and mechanical properties of alumina films
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TLDR
Amorphous alumina films, approximately 600 nm in thickness, prepared on Si(100) substrates by RF magnetron sputtering were irradiated with 2.0 MeV Si + ions at a dose of 1×10 17 ions/cm 2 and the influence on the composition, microstructure, and mechanical properties was examined by Rutherford backscattering, X-ray diffraction and nanoindentation measurements as mentioned in this paper.Abstract:
Amorphous alumina films, approximately 600 nm in thickness, prepared on Si(100) substrates by RF magnetron sputtering were irradiated with 2.0 MeV Si + ions at a dose of 1×10 17 ions/cm 2 and the influence on the composition, microstructure, and mechanical properties was examined by Rutherford backscattering, X-ray diffraction and nano-indentation measurements. It was found that the O/Al ratio in the films was approximately 1.5, and there was no significant alteration in this ratio after ion irradiation. However, a structural change from amorphous to the crystalline γ-alumina was observed. Hardness and elastic modulus of the irradiated film were significantly increased from approximately 11 and 181 GPa up to approximately 25 and 246 GPa, respectively.read more
Citations
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Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition
C. Cibert,H. Hidalgo,Corinne Champeaux,Pascal Tristant,C. Tixier,J. Desmaison,Alain Catherinot +6 more
TL;DR: In this paper, the chemical, structural, mechanical and optical properties of thin aluminum oxide films deposited at room temperature (RT) and 800 °C on (100) Si and Si-SiO2 substrates by pulsed laser deposition and plasma enhanced chemical vapor deposition are investigated and compared.
Journal ArticleDOI
Deposition and characterization of alumina films produced by combustion flame pyrolysis
R. Kavitha,Vikram Jayaram +1 more
TL;DR: In this article, the effect of solvent composition on crystallinity, transformation temperature and hardness of as-deposited amorphous polysilicon and stainless steel substrates was studied.
Journal ArticleDOI
Effect of swift heavy ion irradiation on the hardness of chromium nanorods
Rupali Nagar,Bodh Raj Mehta,J. P. Singh,Deepti Jain,V. Ganesan,S. V. Kesapragada,Daniel Gall +6 more
TL;DR: In this article, the use of swift heavy ion irradiation as a means to tailor the hardness of chromium nanorod coatings was reported, which showed that the hardness increases with fluence.
Journal ArticleDOI
Temperature Dependent 4-, 5- and 6-Fold Coordination of Aluminum in MOCVD-Grown Amorphous Alumina Films: From Local Coordination to Material Properties
Alain Gleizes,Diane Samélor,Constantin Vahlas,Vincent Sarou-Kanian,Pierre Florian,Dominique Massiot +5 more
TL;DR: In this paper, a series of thin films of aluminum oxide prepared by metalorganic chemical vapor deposition (MOCVD) in the temperature range 360 ≤ Td ≤ 720 °C were analyzed.
Journal ArticleDOI
Tailoring the spring constant of Si nanorod structures using swift heavy ion irradiation
TL;DR: In this paper, a post-deposition technique of engineering the mechanical properties of cantilever-like silicon nanorods by using swift heavy ion irradiation was reported. But the results of the experiment were limited to the case where the nanorod was grown by glancing angle deposition on a patterned Si(1/0/0) substrate.
References
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Algorithms for the rapid simulation of Rutherford backscattering spectra
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Journal ArticleDOI
A semiautomatic algorithm for rutherford backscattering analysis
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Journal ArticleDOI
Mechanism of low-temperature (≤300 °C) crystallization and amorphization for the amorphous Si layer on the crystalline Si substrate by high-energy heavy-ion beam irradiation
TL;DR: The author elucidates the low-temperature (120--300 {degree}C) crystallization mechanism and the low -temperature amorphization mechanism, where the thermal diffusion of vacancies towards the amorphous layer, produced by nuclear scattering of incident heavy ions in the crystalline substrate, plays an important role in theLow-tem temperature crystallization.