Peter L. G. Ventzek

TL;DR: In this paper, a first electrode and a second electrode are arranged in the upper portion of a processing chamber as to face a mounting table, and a gas supply unit for supplying a processing gas between the first and the second electrode, a RF power supply unit, for converting the process gas supplied between the electrodes into a plasma, and an exhaust unit for evacuating the inside of the processing chamber to a vacuum level from the lower portion of processing chamber.

TL;DR: In this article, a two-dimensional model for an inductively coupled Ar/c-C4F8 plasma discharge is described, which is widely used in the microelectronics industry for dielectric etching and polymerization.

TL;DR: The QDB project as mentioned in this paper provides a platform for provision, exchange, and validation of chemistry datasets, including electron scattering and heavy-particle reactions, by collating published data into reaction sets, which are then validated against experimental data where possible.

TL;DR: The QDB project as mentioned in this paper provides a platform for provision, exchange, and validation of chemistry datasets, including electron scattering and heavy-particle reactions, by collating published data into reaction sets, which are then validated against experimental data where possible.

TL;DR: In this article, a high-resolution self-consistent numerical simulation of electromagnetic wave phenomena in an axisymmetric capacitively coupled plasma reactor is reported, which reveals the presence of well-resolved high frequency harmonic content up to the 20th harmonic of the excitation frequency.