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S. Ramanathan

Researcher at Indian Institute of Technology Madras

Publications -  36
Citations -  1655

S. Ramanathan is an academic researcher from Indian Institute of Technology Madras. The author has contributed to research in topics: Chemical-mechanical planarization & Copper. The author has an hindex of 17, co-authored 35 publications receiving 1316 citations.

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The effect of hydrogen peroxide on polishing removal rate in CMP with various abrasives

TL;DR: The effect of hydrogen peroxide in chemical planarization slurries for shallow trench isolation was investigated in this article, where various abrasives used in this study were ceria, silica, alumina, zirconia, titania, silicon carbide, and silicon nitride.
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Effect of potential drifts and ac amplitude on the electrochemical impedance spectra

TL;DR: In this paper, the electrochemical impedance spectra (EIS) of nonlinear and unstable electrochemical systems are numerically simulated and the effects of linear and exponential potential drifts on the EIS of anodic dissolution are examined.
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Facile synthesis of palladium nanoclusters and their catalytic activity in Sonogashira coupling reactions

TL;DR: In this article, a facile synthesis of palladium nanoclusters (PdNCs) in MeCN/MeOH mixture without any stabilizer was reported, and they were found to be effective catalysts for copper-free, amine-free and ligand-free Songashira coupling reactions under ambient conditions.
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Characterization of non-amine-based post-copper chemical mechanical planarization cleaning solution ☆

TL;DR: In this article, a non-amine-based alkaline cleaning solution was developed and the solution was characterized based on the benzotriazole (organic residue) removal and particle removal efficiency.
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Potassium Bromate as an Oxidizing Agent in a Titania-Based Ru CMP Slurry

TL;DR: In this paper, the removal rate enhancement saturates at 0.75 mM bromate and 4 wt % titania at different concentra-tions of abrasive and oxidizing agent.