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T. D. Corrigan

Researcher at Argonne National Laboratory

Publications -  15
Citations -  994

T. D. Corrigan is an academic researcher from Argonne National Laboratory. The author has contributed to research in topics: Field electron emission & Diamond. The author has an hindex of 10, co-authored 15 publications receiving 982 citations. Previous affiliations of T. D. Corrigan include Northwestern University.

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Field emission from nanotube bundle emitters at low fields

Qiang Wang, +4 more
- 16 Jun 1997 - 
TL;DR: In this paper, the fabrication of nanotube field emitters with an onset field as low as 0.8 V/μm is described and the low-field electron emission mechanism is discussed.
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Synthesis and electron field emission of nanocrystalline diamond thin films grown from N2/CH4 microwave plasmas

Dan Zhou, +8 more
- 01 Nov 1997 - 
TL;DR: In this paper, the effect of incorporated nitrogen on the field emission characteristics of the nanocrystalline films is discussed, and the effects of the incorporated nitrogen concentration on field emission properties are investigated.
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The effect of nitrogen addition to Ar/CH4 plasmas on the growth, morphology and field emission of ultrananocrystalline diamond

T. D. Corrigan, +4 more
- 01 Jan 2002 - 
TL;DR: In this article, the effect of the addition of nitrogen to plasmas during the CVD growth of diamond films on field emission properties has been studied and a model is discussed in which the nitrogen preferentially enters the grain boundaries and promotes sp2 bonding in the neighboring carbon atoms.
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The Structure and Electrochemical Behavior of Nitrogen-Containing Nanocrystalline Diamond Films Deposited from CH4/N2/Ar Mixtures

Qingyun Chen, +7 more
- 01 Jan 2001 - 
TL;DR: In this paper, boron-doped microcrystalline diamond films (approximately 750 to 1000 nm thick) were deposited on conducting Si and W substrates from CH{sub 4}/N{sub 2}/Ar gas mixtures using plasma-enhanced chemical vapor deposition.
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Low temperature growth of ultrananocrystalline diamond on glass substrates for field emission applications.

T. D. Corrigan, +5 more
- 01 Jan 1999 - 
TL;DR: In this article, the authors have grown ultrananocrystalline diamond (UNCD) films using a unique microwave plasma technique that involves CH{sub 4}-Ar gas mixtures, as opposed to the conventional CH {sub 4]-H{sub 2} plasma CVD method.