T
Thomas F. Kuech
Researcher at University of Wisconsin-Madison
Publications - 640
Citations - 13102
Thomas F. Kuech is an academic researcher from University of Wisconsin-Madison. The author has contributed to research in topics: Epitaxy & Metalorganic vapour phase epitaxy. The author has an hindex of 55, co-authored 638 publications receiving 12426 citations. Previous affiliations of Thomas F. Kuech include Corning Inc. & Pennsylvania State University.
Papers
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Journal ArticleDOI
Catalyst Design with Atomic Layer Deposition
Brandon J. O'Neill,Brandon J. O'Neill,David H. K. Jackson,Jechan Lee,Christian P. Canlas,Peter C. Stair,Christopher L. Marshall,Jeffrey W. Elam,Thomas F. Kuech,James A. Dumesic,George W. Huber +10 more
TL;DR: Atomic layer deposition (ALD) has emerged as an interesting tool for the atomically precise design and synthesis of catalytic materials as mentioned in this paper, which can be used to elucidate reaction mechanisms and catalyst structure-property relationships by creating materials with a controlled distribution of size, composition, and active site.
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Long-range order in Al x Ga 1-x As
TL;DR: Premiere observation d'un ordre a longue distance dans un compose III-V est l'etat d'equilibre.
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Surface Chemistry of Prototypical Bulk II-VI and III-V Semiconductors and Implications for Chemical Sensing.
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Determination of the interdiffusion of Al and Ga in undoped (Al,Ga)As/GaAs quantum wells
TL;DR: In this article, photoluminescence spectroscopy was employed to determine the temperature dependence of the interdiffusion coefficient of Al and Ga in GaAs/Al03Ga07As quantum wells.
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Mechanism of carbon incorporation in MOCVD GaAs
Thomas F. Kuech,E. Veuhoff +1 more
TL;DR: In this article, the incorporation of carbon in GaAs epitaxial layers, an important problem in MOCVD, has been studied over a wide range of experimental parameters: growth temperature, AsH 3 Ga(CH 3 ) 3 ratio, carrier gas, as well as substrate orientation.