U
Ulrich Kroll
Researcher at University of Neuchâtel
Publications - 116
Citations - 5764
Ulrich Kroll is an academic researcher from University of Neuchâtel. The author has contributed to research in topics: Silicon & Micromorph. The author has an hindex of 37, co-authored 115 publications receiving 5644 citations.
Papers
More filters
Journal ArticleDOI
Thin‐film silicon solar cell technology
Arvind Shah,Horst Schade,Milan Vanecek,Johannes Meier,Evelyne Vallat-Sauvain,Nicolas Wyrsch,Ulrich Kroll,C. Droz,Julien Bailat +8 more
TL;DR: In this article, the authors describe the use of hydrogenated amorphous silicon (a-Si:H) and hydrogenated micro-crystalline silicon (μc-Si-H) thin films (layers), both deposited at low temperatures (200°C) by plasma-assisted chemical vapour deposition (PECVD), from a mixture of silane and hydrogen.
Journal ArticleDOI
Material and solar cell research in microcrystalline silicon
Arvind Shah,Johannes Meier,Evelyne Vallat-Sauvain,Nicolas Wyrsch,Ulrich Kroll,C. Droz,U. Graf +6 more
TL;DR: In this paper, the authors describe the introduction of hydrogenated microcrystalline silicon (μc-Si:H) as novel absorber material for thin-film silicon solar cells.
Journal ArticleDOI
Low pressure chemical vapour deposition of ZnO layers for thin-film solar cells: temperature-induced morphological changes
TL;DR: In this article, a study of ZnO material deposited by the low-pressure chemical vapour deposition technique, in a pressure range below the pressures usually applied for the deposition of this kind of material, is presented.
Journal ArticleDOI
Hydrogen in amorphous and microcrystalline silicon films prepared by hydrogen dilution
TL;DR: In this paper, a large range of silane dilution investigated can be divided into an amorphous and a micro-crystalline zone, separated by a narrow transition zone at a dilution level of 7.5%.
Journal ArticleDOI
Rough ZnO Layers by LP-CVD Process and their Effect in Improving Performances of Amorphous and Microcrystalline Silicon Solar Cells
TL;DR: In this paper, a method is proposed to optimize the light-scattering capacity of ZnO layers, and the incorporation of these layers as front transparent conductive oxides for p-i-n thin-film microcrystalline silicon solar cells is studied.