U
Uwe Mühle
Researcher at Dresden University of Technology
Publications - 40
Citations - 547
Uwe Mühle is an academic researcher from Dresden University of Technology. The author has contributed to research in topics: Microstructure & Creep. The author has an hindex of 11, co-authored 40 publications receiving 391 citations. Previous affiliations of Uwe Mühle include Freiberg University of Mining and Technology & Fraunhofer Society.
Papers
More filters
Journal ArticleDOI
Nanomaterials: certain aspects of application, risk assessment and risk communication.
Peter Laux,Jutta Tentschert,Christian Riebeling,Albert Braeuning,Otto Creutzenberg,Astrid Epp,Valérie Fessard,Karl-Heinz Haas,Andrea Haase,Kerstin Hund-Rinke,Norbert Jakubowski,Peter Kearns,Alfonso Lampen,Hubert Rauscher,Reinhilde Schoonjans,Angela Störmer,Axel Thielmann,Uwe Mühle,Andreas Luch +18 more
TL;DR: An improvement of material characterization in both toxicological testing as well as end-product control was concluded as being the main obstacle to ensure not only safe use of materials, but also wide acceptance of this and any novel technology in the general public.
Journal ArticleDOI
Enabling Energy Efficiency and Polarity Control in Germanium Nanowire Transistors by Individually Gated Nanojunctions
Jens Trommer,Andre Heinzig,Uwe Mühle,Uwe Mühle,Markus Löffler,Annett Winzer,Paul M. Jordan,Jurgen Beister,Tim Baldauf,Marion Geidel,B. Adolphi,Ehrenfried Zschech,Thomas Mikolajick,Walter M. Weber +13 more
TL;DR: Finite-element drift-diffusion simulations reveal that both leakage current suppression and polarity control can also be achieved at highly scaled geometries, providing solutions for future energy-efficient systems.
Journal ArticleDOI
CO addition in low-pressure chemical vapour deposition of medium-temperature TiCxN1-x based hard coatings
Christoph Czettl,Christian Mitterer,Uwe Mühle,David Rafaja,S. Puchner,Herbert Hutter,M. Penoy,C. Michotte,Martin Kathrein +8 more
TL;DR: In this paper, five different TiCxN1-x coatings were grown by medium-temperature CVD with increasing CO fractions in the TiCl4-CH3CN-H2-N2-CO feed gas using an industrial-scale low-pressure CVD system.
Journal ArticleDOI
Effect of the deposition process and substrate temperature on the microstructure defects and electrical conductivity of molybdenum thin films
David Rafaja,Harald Köstenbauer,Uwe Mühle,C. Löffler,Gerhard Schreiber,Martin Kathrein,Jörg Winkler +6 more
TL;DR: In this paper, the effect of point defects, dislocations and grain boundaries on the electron scattering in molybdenum thin films having a constant thickness of 500nm was described quantitatively in form of a dependence of the electrical resistivity on the concentration of impurity atoms, stress-free lattice parameter, microstrain and grain size.
Journal ArticleDOI
Single crystal strontium titanate surface and bulk modifications due to vacuum annealing
Juliane Hanzig,Barbara Abendroth,Florian Hanzig,Hartmut Stöcker,R. Strohmeyer,Dirk C. Meyer,Susi Lindner,Mandy Grobosch,Martin Knupfer,Cameliu Himcinschi,Uwe Mühle,Frans Munnik +11 more
TL;DR: In this article, a survey of the real structure of commercially available SrTiO3 single crystals and the changes induced by reducing vacuum heat-treatment is provided, where all investigations were performed ex situ, i.e., after the annealing process.