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Wengang Wu

Researcher at Peking University

Publications -  174
Citations -  1794

Wengang Wu is an academic researcher from Peking University. The author has contributed to research in topics: Etching (microfabrication) & Threshold voltage. The author has an hindex of 22, co-authored 159 publications receiving 1500 citations.

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High-Performance Normally-Off ${\rm Al}_{2}{\rm O}_{3}/{\rm GaN}$ MOSFET Using a Wet Etching-Based Gate Recess Technique

TL;DR: In this paper, a fully recessed Al2O3/GaN gate-recessed MOSFET using a low-damage digital recess technique featuring multiple cycles of plasma oxidation and wet oxide removal process was reported.
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Microfluidic Surface‐Enhanced Raman Scattering Sensors Based on Nanopillar Forests Realized by an Oxygen‐Plasma‐Stripping‐of‐Photoresist Technique

TL;DR: The novel surface-enhanced Raman scattering (SERS) sensor shows much higher measurement repeatability than the open substrate, and it reduces the sample preparation time from several hours to a few minutes, which makes the device more reliable and facile for trace chemical and biological analysis.
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Fabrication of Normally Off AlGaN/GaN MOSFET Using a Self-Terminating Gate Recess Etching Technique

TL;DR: In this paper, a self-terminating gate recess etching technique was proposed to fabricate normally off AlGaN/GaN MOSFETs, which exhibited a threshold voltage as high as 3.2 V with a maximum drain current over 200 mA/mm and a 60% increased breakdown voltage than that of the conventional high electron mobility transistors.
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Frequency-Independent Asymmetric Double- $pi $ Equivalent Circuit for On-Chip Spiral Inductors: Physics-Based Modeling and Parameter Extraction

TL;DR: A frequency-independent compact model for silicon on-chip spiral inductors with an asymmetric double-pi equivalent circuit incorporating high-order parasitics such as skin effect and proximity effect and a novel approach to extracting the model parameters is developed based on measured S-parameters.
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Investigation of Surface- and Buffer-Induced Current Collapse in GaN High-Electron Mobility Transistors Using a Soft Switched Pulsed \(I-V\) Measurement

TL;DR: The soft-switched pulsed I-V measurement provides an effective method to distinguish between the surface- and buffer-related current collapse in group III-nitride HEMTs.