scispace - formally typeset
Y

Yang Liu

Researcher at University of Electronic Science and Technology of China

Publications -  83
Citations -  870

Yang Liu is an academic researcher from University of Electronic Science and Technology of China. The author has contributed to research in topics: Terahertz radiation & Microstrip. The author has an hindex of 12, co-authored 83 publications receiving 635 citations. Previous affiliations of Yang Liu include University of Hong Kong & Nanyang Technological University.

Papers
More filters
Journal ArticleDOI

Annealing effect on the optical properties of implanted silicon in a silicon nitride matrix

TL;DR: In this article, the effect of thermal annealing on the dielectric functions of implanted Si has been investigated, and it is shown that the suppressed Dielectric Functions of the implanted Si are dominated by the energy transitions related to the critical point E2.
Journal ArticleDOI

A Novel 3-dB Waveguide Hybrid Coupler for Terahertz Operation

TL;DR: In this paper, a 3-dB waveguide hybrid coupler with three coupling branches with a circular cutout at the top and bottom on both sides of the main branch is proposed.
Journal ArticleDOI

Gate Field Plate Structure for Subthreshold Swing Improvement of Si Line-Tunneling FETs

TL;DR: A gate field plate TFET (GFP-TFET) structure is proposed to enhance the driving current and suppress the current kink induced by fringe-induced barrier lowering and increase the subthreshold characteristics of this TFET.
Journal ArticleDOI

Magnetron Sputtered Ni‐rich Nickel Oxide Nano‐Films for Resistive Switching Memory Applications

TL;DR: In this article, the memory window was well maintained within the time limit of the experiment (5 × 104 s), exhibiting good memory retention, suggesting that the formation and annihilation of a conductive filament are responsible for the resistive switching behavior.
Journal ArticleDOI

Resistive Switching Behavior of Partially Anodized Aluminum Thin Film at Elevated Temperatures

TL;DR: In this article, the authors investigated the resistive switching behavior of partially anodized aluminum thin film at temperatures of 25 $ √ hbox{C}$ −250 $√ h box{C]$.