Characterization of a high-intensity bipolar-mode pulsed ion source for surface modification of materials

TLDR: In this article, a high-intensity pulsed ion source of TEMP-type series, operating in bipolar mode, has been developed as a unique pulsed energy source to produce a high intensity pulsed Ion Beam (HIPIB) for surface modification of materials.

Abstract: A high-intensity pulsed ion source of TEMP-type series, operating in bipolar mode, has been developed as a unique pulsed energy source to produce a high-intensity pulsed ion beam (HIPIB) for surface modification of materials. To generate the ion beam, a specially shaped bipolar pulse, consisting of a first negative pulse and a second delayed positive pulse both of nanosecond width, is formed by a double coaxial pulse-forming line (PFL) powered with a Marx generator and supplied to a magnetically insulated ion diode (MID) by a self-magnetic field. It is found that the efficient generation of a HIPIB is mainly dependent on the delay time of the bipolar pulse, adjusted by pressure ratio in the two gas switches of a PFL, and the anode–cathode (A–K) gap distance in the self-magnetic field MID. The delay time determines the effective area on the anode surface for plasma generation and the A–K gap distance ensures the stability of the process. A proper delay time and a proper A–K gap distance are obtained by a s...