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Dimensional Metrology on Micro-and Meso-Scale

Osamu Sato
- 01 Jan 2008 - 
- Vol. 74, Iss: 3, pp 217-221
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This article is published in Journal of The Japan Society for Precision Engineering.The article was published on 2008-01-01 and is currently open access. It has received 0 citations till now. The article focuses on the topics: Dimensional metrology.

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Journal ArticleDOI

Metrology of freeform shaped parts

TL;DR: In this article, the authors present the state of the art in the metrology of freeform shapes with focus on the freeform capabilities of the most important measuring techniques and on related metrological issues.
Journal ArticleDOI

Dimensional micro and nano metrology

TL;DR: The need for dimensional micro and nano metrology is evident, and as critical dimensions are scaled down and geometrical complexity of objects is increased, the available technologies appear not sufficient as mentioned in this paper.
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Current Status in, and Future Trends of, Ultraprecision Machining and Ultrafine Materials Processing

Norio Taniguchi
- 01 Jan 1983 - 
TL;DR: In this article, the historical progress of machining accuracy is plotted and its probable further development is shown by extrapolation, both in the micro-technology and nano-technology regions, and the problems to be addressed and solved in achieving true accuracies of 0.1 μm - 0.05 μm for electronic, optical and mechanical workpieces; measuring resolution and random errors in the required ultra-precision processing machines will have to be no worse than 0.01 μm (10 nm).
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Probing systems for dimensional micro- and nano-metrology

TL;DR: The challenges and demands of micro systems technology on probing systems and different practical approaches for satisfying them will be presented with their special characteristics, fields and limits of application.
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Metrological large range scanning probe microscope

TL;DR: In this paper, the authors describe a metrological large range scanning probe microscope (LR-SPM) with an Abbe error free design and direct interferometric position measurement capability, aimed at traceable topographic measurements that require nanometer accuracy.