Journal ArticleDOI
Electroless Nickel Plating on Silicon
TLDR
In this article, an electroless Ni plating of Si wafers with p-n junctions using conventional solutions was performed and a pronounced difference in plating rate between p and n-type surfaces was observed.Abstract:
In the study of electroless Ni plating of Si wafers with p‐n junctions using conventional solutions, a pronounced difference in plating rate between p‐ and n‐type surfaces is observed. Further experiments show that rate difference probably should not only be attributed to the photovoltaic effect generated at the p‐n junctions but also to the electronegativity difference between p‐ and n‐type Si. The latter effect can be changed by addition of such material as or to the plating solution. Whereas addition increases the rate difference, EDTA addition decreases it. This fact which can be put to practical use gives an extra support for the explanation given above.read more
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Journal ArticleDOI
Review of the Potential of the Ni/Cu Plating Technique for Crystalline Silicon Solar Cells.
Atteq ur Rehman,Soo Hong Lee +1 more
TL;DR: The formation of a Ni seed layer by adopting various deposition techniques and a Cu conducting layer using a light induced plating (LIP) process are appraised and a step involving patterning is crucial for opening the masking layer.
Journal ArticleDOI
Crystallisation and Phase Transformation Behaviour of Electroless Nickel-Phosphorus Deposits and Their Engineering Properties
K.G. Keong,Wei Sha +1 more
TL;DR: In this article, the effect of crystallization and phase transformation behavior on the microstructure and material properties of electroless Ni-P deposits is critically reviewed and a comparison is made with other commonly used engineering deposits such as electroplated nickel and hard chromium.
Journal ArticleDOI
The growth morphology and crystallinity of electroless NiP deposition on silicon
Ting-Kan Tsai,Chuen-Guang Chao +1 more
TL;DR: In this paper, the growth morphology and crystallinity of NiP on Si substrate was studied using transmission electron microscopy, field emission scanning electron microscope (FESEM), and energy dispersive X-ray spectrum (EDS).
Journal ArticleDOI
Review of Ni-Cu Based Front Side Metallization for c-Si Solar Cells
TL;DR: A brief overview of various front side patterning techniques is presented in this paper, where the problem of background plating for Ni-Cu based metallization along with the various methods for characterization is summarized.
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Related Papers (5)
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