Patent
Exposure device and method
Kazushi Nakano,一志 中野 +1 more
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TLDR
In this paper, an exposure device is used to fill a space between the final surface of a projection optical system and a substrate with a liquid in an immersion device to which an immersion method is applied.Abstract:
PROBLEM TO BE SOLVED: To surely fill a space between the final surface of a projection optical system and a substrate with a liquid in an exposure device to which an immersion method is applied SOLUTION: This exposure device comprises a liquid supply nozzle 5 disposed in the periphery of the projection optical system 4 and in the first direction as seen from the projecting optical system When a substrate 9 is moved in the second direction opposite to the first direction by a substrate stage 10, the liquid is supplied onto the surface of the substrate 9 through the liquid supply nozzle 5 to form a liquid film f on that surface Here, the liquid is continuously supplied onto the surface of the substrate 9 through the liquid supply nozzle 5 so that the liquid film f is continuously spread as the substrate 9 moves COPYRIGHT: (C)2005,JPO&NCIPIread more
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Patent
Lithographic apparatus, and device manufacturing method
Maarten Marinus Johannes Wilhelmus Van Herpen,Vadim Yevgenyevich Banine,Johannes Peterus Henricus De Kuster,Johannes Hubertus Josephina Moors,Lucas Henricus Johannes Stevens,Bastiaan Theodoor Wolschrijn,Yurii Victorovitch Sidelnikov,Marc Hubertus Lorenz Van Der Velden,Wouter Anthon Soer,Thomas Stein,K Kurt Gielissen +10 more
TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
Patent
Exposure apparatus, and device manufacturing method
TL;DR: In this paper, an exposure apparatus for emitting exposure light onto a substrate via a projection optical system and a liquid to expose the substrate includes a supply pipe which supplies the liquid, a recovery pipe which recovers the liquid; a connection pipe which connects the supply pipe and the recovery pipe; and a switching device which switches a flow path of the liquid so that when liquid supply is stopped, the liquid that has flowed into the input pipe flows to the output pipe via the connection pipe.
Patent
Exposure apparatus and method for producing device
Naoyuki Kobayashi,Akikazu Tanimoto,Yasushi Mizuno,Kenichi Shiraishi,Katsushi Nakano,Soichi Owa +5 more
TL;DR: In this article, an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid.
Patent
Apparatus and method for providing fluid for immersion lithography
TL;DR: In this article, a fluid is provided in a space between the lens and the substrate during the immersion lithography process and the fluid is recovered from the space through a porous member in fluidic communication with the space.
Patent
Exposure device and device manufacturing method
Naoyuki Kobayashi,Akikazu Tanimoto,Yasushi Mizuno,Kenichi Shiraishi,Katsushi Nakano,Soichi Owa +5 more
TL;DR: In this paper, an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid.
References
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Patent
Projection exposure method and system
Yoshio Fukami,Nobutaka Magome +1 more
TL;DR: In this paper, a projection exposure method capable of keeping a liquid (7) filled between a projection optical system (PL) and a wafer (W) even while the wafer is being moved when a liquid immersion method is used to conduct an exposure, wherein a discharge nozzle (21a) and inflow nozzles (23a, 23b) are disposed so as to hold a lens (4) at the tip end of the projection optical systems (PL), in an X direction.
Patent
Liquid-soaking type projection exposure apparatus
Kazuo Takahashi,一雄 高橋 +1 more
TL;DR: In this paper, a liquid soaking method was applied to an exposure apparatus, so that an inexpensive exposure apparatus with which effect according respective wavelengths irrespective of a wavelength of an exposure light source can be expected can be obtained.
Patent
Lithography apparatus, and device manufacturing method
TL;DR: In this paper, a lithography apparatus and device manufacturing methods are disclosed, including a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage relative to a reference frame by using the sensor part to interact with the reference part.
Patent
Lithography system and process for fabricating device
Joeri Lof,ロフ ヨエリ,Erik Theodorus Maria Bijlaart,テオドルス マリア ビユラールト エリク,Hans Butler,ブトレル ハンス,Sjoerd Nicolaas Lambertus Donders,ニコラース ラムベルトゥス ドンデルス シュオエルド,Christiaan Alexander Hoogendam,アレクサンデル ホーゲダム クリスティアーン,Aleksey Yurievich Kolesnychenko,コレスニチェンコ アレクセイ,Erik Roelof Loopstra,ローロフ ロープストラ エリク,Hendricus Johannes Maria Meijer,ヨハンネス マリア メイユエール ヘンドリクス,Jeroen Johannes Sophia Maria Mertens,ヨハンネス ソフィア マリア メルテンス イエローン,Johannes Catharinus Hubertus Mulkens,カタリヌス フベルトゥス ムルケンス ヨハンネス,Roelof Aeilko Siebrand Ritsema,アエイコ シーブランド リトセマ ローロフ,Frank van Schaik,ファン スカイク フランク,Timotheus Franciscus Sengers,フランシスカス センゲルス ティモテウス,Klaus Simon,シモン クラウス,Smit Johannes Theodoor De,テオドール デ スミット ヨハンネス,Alexander Straaijer,ストラーイユエール アレクサンデル,Bob Streefkerk,ストレーフケルク ボブ,Santen Helmar Van,ファン サンテン ヘルマール +35 more
TL;DR: In this paper, a gas seal is formed between the sealing member and the plane of the substrate and the liquid is confined in that space, and the space between the final element of the projection system and the substrate table of the lithography projector is surrounded by a sealing member.
Patent
Exposure device and device manufacturing method
Naoyuki Kobayashi,Akikazu Tanimoto,Yasushi Mizuno,Kenichi Shiraishi,Katsushi Nakano,Soichi Owa +5 more
TL;DR: In this paper, an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid.
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