Journal ArticleDOI
Fabrication of subwavelength structure for improvement in light-extraction efficiency of light-emitting devices using a self-assembled pattern of block copolymer
Koji Asakawa,Akira Fujimoto +1 more
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TLDR
A new fabrication method to improve the optical extraction efficiency of light-emitting devices is presented, which does not require expensive exposure lithography tools and is therefore suitable for conventional semiconductor processes.Abstract:
A new fabrication method to improve the optical extraction efficiency of light-emitting devices is presented. The morphology of a self-assembled block copolymer was transferred to the surface of a compound semiconductor to achieve a subwavelength columnar structure. The optical extraction efficiency of the substrates with subwavelength columnar structures of 350 nm pillar height, 130 nm diameter, and 180 nm pitch, improved 2.2 times compared to unprocessed substrates. This method does not require expensive exposure lithography tools and is therefore suitable for conventional semiconductor processes.read more
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Journal Article
Fabrication of Microcone Array for Antireflection Structured Surface Using Metal Dotted Pattern : Optics and Quantum Electronics
TL;DR: In this article, an antireflection surface with sub-wavelength structure has been successfully fabricated on a fused silica substrate, which consists of a microcone array made by a reactive ion etching method using fluorocarbon plasma.
Patent
Thermal anneal of block copolymer films with top interface constrained to wet both blocks with equal preference
Dan B. Millward,Timothy A. Quick +1 more
TL;DR: In this article, methods for fabricating sublithographic, nanoscale microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Patent
One-Dimensional Arrays of Block Copolymer Cylinders and Applications Thereof
Dan B. Millward,Karl Stuen +1 more
TL;DR: In this paper, methods for fabricating sublithographic, nanoscalc microstructures in one-dimensional arrays utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Patent
Methods of improving long range order in self-assembly of block copolymer films with ionic liquids
TL;DR: In this paper, a method for fabricating arrays of nanoscaled alternating lamellae or cylinders in a polymer matrix having improved long range order utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.
Patent
Registered structure formation via the application of directed thermal energy to diblock copolymer films
Dan B. Millward,Eugene P. Marsh +1 more
TL;DR: In this article, a multilayer induced ordering approach is used to align lamellar films to an underlying base film within trenches, and localized heating to anneal the lamella-phase block copolymer film overlying the trenches and outwardly over the remaining surface.
References
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Journal ArticleDOI
Rigorous coupled-wave analysis of planar-grating diffraction
M. G. Moharam,Thomas K. Gaylord +1 more
TL;DR: In this article, a rigorous coupled-wave approach is used to analyze diffraction by general planar gratings bounded by two different media, and the analysis is based on a state-variables representation and results in a unifying, easily computer-implementable matrix formulation.
Journal ArticleDOI
Block copolymer lithography: Periodic arrays of ~1011 holes in 1 square centimeter
TL;DR: In this paper, dense periodic arrays of holes and dots have been fabricated in a silicon nitride-coated silicon wafer and transferred directly to the underlying silicon oxide layer by two complementary techniques.
Journal ArticleDOI
Local Control of Microdomain Orientation in Diblock Copolymer Thin Films with Electric Fields
T. L. Morkved,M. Lu,Augustine Urbas,E. E. Ehrichs,Heinrich M. Jaeger,P. Mansky,Thomas P. Russell +6 more
TL;DR: Local control of the domain orientation in diblock copolymer thin films can be obtained by the application of electric fields on micrometer-length scales by spin-coated onto substrates previously patterned with planar electrodes.
Patent
Method for manufacturing porous structure and method for forming pattern
TL;DR: In this article, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in monomeres unit, No represents the amount of oxygen atoms in a monomere unit.
Journal ArticleDOI
Broadband antireflection gratings fabricated upon silicon substrates.
TL;DR: A two-dimensional subwavelength structured (SWS) surface upon a crystal silicon substrate patterned by electron beam lithography and etched by an SF(6) fast atom beam was fabricated and the reflectivity was examined.