Journal ArticleDOI
Gas phase versus surface contributions to photolytic laser chemical vapor deposition rates
TLDR
In this paper, the rate of photolytic laser chem. vapor deposition (LCVD) of Pt was measured for l = 350 nm as a function of light intensity and metal pressure.Abstract:
The rate of cw photolytic laser chem. vapor deposition (LCVD) of Pt was measured for l = 350 nm as a function of light intensity and metalorg. vapor pressure. The growth of the metal films was studied in situ and in real time by monitoring optical transmission. At low intensities the transmitted light decreases monotonically with time, and the LCVD process is photolytic with its rate limiting step in the surface adlayer. At higher intensities 2 distinct time domains were obsd. An improved method for distinguishing between adlayer and gas-phase limiting processes is demonstrated. These observations are confirmed by studying the photolytic deposition rates while varying the thickness of the adlayer.read more
Citations
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Journal ArticleDOI
Chemical vapor deposition of metals: Part 1. An overview of CVD processes
TL;DR: In this article, a review of the chemical vapor deposition (CVD) of metals is presented, where metal-containing compounds are being synthesized as new precursors, and the results from CVD experiments can be used to assist in the development of new CVD precursor.
Journal ArticleDOI
Chemical Vapor Deposition of Iridium, Platinum, Rhodium and Palladium
J. R. Vargas Garcia,Takashi Goto +1 more
TL;DR: In this paper, the progress in the chemical vapor deposition of iridium, platinum, rhodium and palladium metals is reviewed and representative results on CVD of these metals are presented according to the type of metal organic complexes used.
Journal ArticleDOI
Platinum, palladium and rhodium complexes as volatile precursors for depositing materials
TL;DR: In this article, the transition-metal complexes of rhodium, palladium and platinum have been classified as volatile, and a classification has been adopted according to the ligands borne by each metal center, and preparation procedures have been given.
Book ChapterDOI
Chemical Vapor Deposition of Metal-Containing Thin-Film Materials from Organometallic Compounds
Journal ArticleDOI
High‐speed laser chemical vapor deposition of copper: A search for optimum conditions
TL;DR: The photothermal laser-induced chemical vapor deposition of copper was studied as a function of the writing speed, the light intensity, and the diameter of the focal spot on the substrate, at three different pressures of the copperbishexafluoroacetylacetonate precursor as discussed by the authors.
References
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Journal ArticleDOI
Temperature rise induced by a laser beam
TL;DR: In this paper, the spatial distribution of the temperature rise induced by a laser beam absorbed in a solid is reduced to a one-dimensional integral which is evaluated numerically, and a closed-form expression in terms of tabulated functions is obtained for the maximum temperature rise.
Journal ArticleDOI
Ultraviolet photodecomposition for metal deposition: Gas versus surface phase processes
TL;DR: In this article, it was shown that the decomposition occurs either in the gas phase or in the adsorbed layer, and the dependence of the writing rate on spot size was shown to cause inhomogeneous deposition.
Journal ArticleDOI
Photodeposition rates of metal from metal alkyls
Robert R. Krchnavek,H. H. Gilgen,Julian C. Chen,Ping S. Shaw,Thomas J. Licata,Richard M. Osgood +5 more
TL;DR: In this article, the laser photodeposition of zinc from diethylzinc is experimentally studied and the results of these experiments verify the trends predicted by a simple theoretical treatment.
Journal ArticleDOI
Growth rates and electrical conductivity of microscopic ohmic contacts fabricated by laser chemical vapor deposition of platinum
TL;DR: In this article, the laser chemical vapor deposition of platinum from its bishexafluoroacetylacetonate derivative was studied with a cw argon ion laser at 458 and 514 nm.