Patent
Liquid crystal display device and method for fabricating the same
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TLDR
In this paper, a liquid crystal display device is described, which reduces the number of masks and improves an aperture ratio, and a method for fabricating the same is presented. But it is not shown how to construct such a display.Abstract:
Disclosed are a liquid crystal display device which reduces the number of masks and improves an aperture ratio, and a method for fabricating the same. The liquid crystal display device includes gate and data lines perpendicularly intersecting on a substrate having pixel and pad parts; a thin film transistor on the substrate at the intersection of the gate and data lines; a pixel electrode on the substrate at the pixel part and connected directly to a drain electrode of the thin film transistor; an insulating film on the overall surface of the substrate including the pixel electrode and the thin film transistor; an organic film on the insulating film over the thin film transistor and the data line; and a common electrode of slit shapes overlapping the pixel electrode such that the insulating film is interposed between the common electrode and the pixel electrode.read more
Citations
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References
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Methods for forming liquid crystal displays including thin film transistors and gate pads having a particular structure
Dong-Gyu Kim,Won-Hee Lee +1 more
TL;DR: In this article, the first and second metal layers are patterned to provide a gate electrode on a TFT area of the substrate and a gate pad on a pad area of a substrate.
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Semiconductor device, its manufacturing method, and electronic device
TL;DR: In this article, a zinc oxide polycrystalline (ZnO) semiconductor with a group V element was used for the isolation of the active layer from the atmosphere, where the surface state of the ZnO semiconductor was reduced thanks to the added element.
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Thin film transistor array panel and manufacturing method thereof
TL;DR: In this paper, a method of manufacturing a thin film transistor array panel is provided, the method includes: forming a gate line on an insulating substrate, forming an gate insulating layer, forming a semiconductor layer, and forming a data conductive layer including a data line and a drain electrode; depositing a passivation layer; forming a photoresist including a first portion located on an end portion of the gate line, a second portion thicker than the first portion and located on the drain electrode, and a third portion larger than the second portion.
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