Phase shift mask and its production and exposure method using the phase shift mask

TLDR: In this article, the phase shift mask has high quality and the process for production thereof by decreasing processes at the time of producing the phase shifter mask and to provide the exposure method using the Phase Shift Mask.

Abstract: PURPOSE:To provide the phase shift mask having high quality and the process for production thereof by decreasing processes at the time of producing the phase shift mask and to provide the exposure method using the phase shift mask CONSTITUTION:A second light transparent part 4 of the phase shift mask 200 is composed of molybdenum silicide oxynitride or molybdenum silicide oxide 4, of which the phase difference attains 180 deg and transmittance is 5 to 40% A molybdenum silicide oxynitricle film or molybdenum silicide oxide film is formed by using a sputtering method in the production stage for the second light transparent part 4 As a result, the second light transparent part is formed by using the conventional sputtering device and since the etching stage of the phase shifter parts is just once, the probability of generating defects and errors in the production stage is lowered