Patent
Phase shifting mask topography effect correction based on near-field image properties
TLDR
In this article, a phase shifting mask (PSM) layout can be corrected using a near-field image, which can provide accurate and quick correction for image intensity imbalance between shifters of different phases.Abstract:
Image intensity imbalance created by a phase shifting mask (PSM) layout can be corrected using a near-field image. Because an aerial image is not used, various parameters associated with the exposure conditions and stepper need not be considered, thereby significantly simplifying the computations to determine the appropriate correction. Of importance, using the near-field image can provide substantially the same correction generated using the aerial image. Thus, using the near-field image can provide an accurate and quick correction for image intensity imbalance between shifters of different phases. After correcting for the image intensity imbalance, additional proximity correction techniques can be applied to the layout to correct for other effects.read more
Citations
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References
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Patent
Optical proximity correction method and apparatus
TL;DR: In this article, a run set is generated from a correction table that has the plurality of correction values used to correct a plurality of features of the layout design that have a selected space dimension.
Fast optical and process proximity correction algorithms for integrated circuit manufacturing
Nicolas B. Cobb,Avideh Zakhor +1 more
TL;DR: The key contributions to the OPC field made in this thesis work include formulation of OPC as a feedback control problem using an iterative solution, and use of fast aerial image simulation for OPC, which truly enables full chip model-based OPC.
Proceedings ArticleDOI
Fast sparse aerial-image calculation for OPC
Nicolas B. Cobb,Avideh Zakhor +1 more
TL;DR: In this article, a fast sparse aerial image simulation and its use in optical proximity correction (OPC) is discussed. But the primary result is a new lookup table formulation of aerial image calculation for a partially coherent optical system, which extends the fast lookup technique to arbitrary polygonal mask geometry.
Patent
Correction method and correction apparatus of mask pattern
TL;DR: In this paper, the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points along an outer periphery of the desired pattern.
Patent
Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout
Christophe Pierrat,Youping Zhang +1 more
TL;DR: In this article, a dissection length parameter is derived based on a profile of amplitudes output by a proximity effects model along a transect, and then it is determined how to correct at least a portion of the first edge for proximity effects based on an analysis at the evaluation point.
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