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Journal ArticleDOI

Photoluminescence Study of Carbon Doped Gallium Arsenide

Masashi Ozeki, +3 more
- 01 Jul 1974 - 
- Vol. 13, Iss: 7, pp 1121-1126
TLDR
The photoluminescence studies of the carbon doped epitaxial gallium arsenide revealed that a pair of emission bands at 1.493 eV and 1.490 eV (D-A) were attributed to the carbon acceptor on arsenic site as discussed by the authors.
Abstract
The photoluminescence studies of the carbon doped epitaxial gallium arsenide revealed that a pair of emission bands at 1.493 eV (B-A) and 1.490 eV (D-A) were attributed to the carbon acceptor on arsenic site. The sharp doublet emission lines at 1.5127 eV and 1.4937 eV were identified with the exciton recombination bound to a neutral carbon acceptor and the two-hole transition in which the neutral carbon acceptor is left in an excited state, respectively. From the observation of these emissions, the 1S3/2 ground and 2S3/2 excited state energies of carbon acceptor were found to be 26.5 meV and 7.5 meV above the valence band edge, respectively. The results were supported by the effective mass arguments and by the dependence of the binding energy on the atomic number of impurities.

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Citations
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Journal ArticleDOI

Carbon doping in molecular beam epitaxy of GaAs from a heated graphite filament

TL;DR: Carbon doping of GaAs grown by molecular beam epitaxy has been obtained for the first time by use of a heated graphite filament as discussed by the authors, which was used for p-type doping in the base of Npn AlGaAs/GaAs heterojunction bipolar transistors.
Journal ArticleDOI

Characterization of high-purity Si-doped molecular beam epitaxial GaAs

TL;DR: In this paper, high purity, lightly Si-doped GaAs layers have been characterized using variabletemperature Hall effect and C-V measurements, photothermal ionization spectroscopy, low-temperature photoluminescence (PL), and deep level transient spectroscope (DLTS).

Characterization of high purity Si-doped molecular beam epitaxial GaAs

TL;DR: In this paper, high purity, lightly Si-doped GaAs layers have been characterized using variabletemperature Hall effect and C-V measurements, photothermal ionization spectroscopy, low-temperature photoluminescence (PL), and deep level transient spectroscope (DLTS).
Journal ArticleDOI

Characterization of Nonuniformity in Semi-Insulating LEC GaAs by Photoluminescence Spectroscopy

TL;DR: In this paper, photoluminescence measurements at 4.2 K were used to investigate the nonuniform distribution of deep levels in semi-insulating (S.I.) LEC GaAs.
Journal ArticleDOI

Photoluminescence identification of the C and Be acceptor levels in InP

TL;DR: In this article, a comparison of the low temperature photoluminescence spectra of these deliberately doped samples was made to similar spectra for undoped high purity InP grown by LPE, PH3-VPE, and LEC techniques in order to identify the residual acceptors in the undoped samples.
References
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Journal ArticleDOI

Gallium Arsenide and Related Compounds

B L H Wilson
- 01 Aug 1973 - 
TL;DR: The maturity of this work on III-V compounds is clear from this volume of papers from the fourth international conference, at Boulder, Colorado as discussed by the authors, and many areas prominent at earlier conferences are largely absent: bulk crystal growth, vapour phase epitaxy, light and infrared emitting diodes, lasers, mixers and varactors.
Journal ArticleDOI

Shallow acceptor luminescence in GaAs grown by liquid phase epitaxy

TL;DR: Two pairs of photoluminescence (PL) emission bands between 1.494 and 1.480 eV have been observed at 4.2°K from high purity, undoped GaAs layers grown by liquid phase epitaxy as discussed by the authors.
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